⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL45153 | 0.76 | — | — | |
| SCHEMBL21246897 | 0.76 | — | — | |
| Ammonia Solution, Strong SCHEMBL27794631 | 0.72 | — | — | |
| SCHEMBL7268213 | 0.69 | — | — | |
| Dimethyl Sulfoxide SCHEMBL1197318 | 0.69 | — | — | |
| Butane SCHEMBL11634303 | 0.69 | — | — | |
| SCHEMBL14083199 | 0.69 | — | — | |
| SCHEMBL5308251 | 0.67 | — | — | |
| SCHEMBL28289597 | 0.67 | — | — | |
| SCHEMBL2476295 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7456311-B2 | Adamantane derivative, process for producing the same, and photosensitive material for photoresist | IDEMITSU KOSAN CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20080009647-A1 | Adamantane Derivative, Process for Producing the Same, and Photosensitive Material for Photoresist | IDEMITSU KOSAN CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |
| EP-1803708-A1 | ADAMANTANE DERIVATIVE, PROCESS FOR PRODUCING THE SAME, AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST | IDEMITSU KOSAN CO., LTD. (JP) | 2007-07-04 | — | — | EP | disclosed |
| EP-0621273-B1 | NOVEL SULFONIC ACIDE DERIVATIVE AND MEDICINAL USE THEREOF | TORAY INDUSTRIES (JP) | 1998-12-09 | — | — | EP | disclosed |
| EP-0704433-B1 | NOVEL SULFONIUM SALT COMPOUND AND POLYMERIZATION INITIATOR | NIPPON SODA CO (JP) | 1998-10-14 | — | — | EP | disclosed |
| CN-1036589-C | New thiazolylbenzofuran derivatives, processes for the preparation thereof and pharmaceutical composition comprising the same | FUJISAWA PHARMACEUTICAL CO (JP) | 1997-12-03 | — | — | CN | disclosed |
| CN-1160403-A | Substd. heterobicyclic alkyl amines and their use as squalene oxide cyclase inhibitors | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1997-09-24 | — | — | CN | disclosed |
| US-5639903-A | CURE EPOXIDES UNDER HEATING IN SHORT TIME | NIPPON SODA CO., LTD. (JP) | 1997-06-17 | — | — | US | disclosed |
| CN-1033088-C | Thiazolylbenzofuran derivatives, processes for preparation thereof and pharmaceutical composition comprising same | FUJISAWA PHARMACEUTICAL CO (JP) | 1996-10-23 | — | — | CN | disclosed |
| EP-0704433-A1 | NOVEL SULFONIUM SALT COMPOUND AND POLYMERIZATION INITIATOR | NIPPON SODA CO., LTD. (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5496849-A | THROMBOXANE A2 RECEPTOR ANTAGONISTS | TORAY INDUSTRIES, INC. (JP) | 1996-03-05 | — | — | US | disclosed |
| EP-0621273-A1 | NOVEL SULFONIC ACIDE DERIVATIVE AND MEDICINAL USE THEREOF | TORAY INDUSTRIES, INC. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0421385-B1 | Process for producing p-hydroxyneophyl m-phenoxybenzyl ether | MITSUI TOATSU CHEMICALS (JP) | 1994-06-22 | — | — | EP | disclosed |
| US-5144083-A | Ether cleavage using a metal alkoxide or hydroxide | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1992-09-01 | — | — | US | disclosed |
| EP-0421385-A1 | Process for producing p-hydroxyneophyl m-phenoxybenzyl ether | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1991-04-10 | — | — | EP | disclosed |