⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3886085 | 1.00 | — | — | |
| SCHEMBL27672149 | 0.87 | TSHR (0.39) | — | |
| SCHEMBL27673514 | 0.83 | TSHR (0.44) | — | |
| SCHEMBL11288089 | 0.81 | HCAR2 (0.38) | — | |
| SCHEMBL1975527 | 0.79 | TSHR (0.50) | — | |
| SCHEMBL1975528 | 0.79 | TSHR (0.50) | — | |
| SCHEMBL27969243 | 0.79 | — | — | |
| SCHEMBL2534737 | 0.78 | TSHR (0.36) | — | |
| SCHEMBL30670325 | 0.78 | HPGD (0.48) | — | |
| SCHEMBL170416 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240222788-A1 | BINDER DISPERSION FOR NON-AQUEOUS SECONDARY BATTERY SEPARATOR, SLURRY COMPOSITION, NON-AQUEOUS SECONDARY BATTERY SEPARATOR, AND NON-AQUEOUS SECONDARY BATTERY | ARTIENCE CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| CN-117461205-A | Binder dispersion for nonaqueous secondary battery separator, slurry composition, nonaqueous secondary battery separator, and nonaqueous secondary battery | 东洋油墨SC控股株式会社 | 2024-01-26 | — | — | CN | disclosed |
| WO-2022254898-A1 | BINDER DISPERSION FOR NON-AQUEOUS SECONDARY BATTERY SEPARATOR, SLURRY COMPOSITION, NON-AQUEOUS SECONDARY BATTERY SEPARATOR, AND NON-AQUEOUS SECONDARY BATTERY | 東洋インキＳＣホールディングス株式会社 | 2022-12-08 | — | — | WO | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-20030013830-A1 | Reacting a thiosulfate salt with a halogenated styrenic monomer to form a styrenic thiosulfate salt monomer and then polymerization of said monomer in the presence of an initiator | BLEVINS RICHARD W (US) | 2003-01-16 | — | — | US | disclosed |
| US-6420505-B1 | STYRENE THIOSULFATE AND OLEFIN MONOMER | EASTMAN KODAK COMPANY | 2002-07-16 | — | — | US | disclosed |