⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8383461 | 0.91 | — | — | |
| SCHEMBL3951521 | 0.85 | — | — | |
| SCHEMBL2804726 | 0.79 | — | — | |
| SCHEMBL28600 | 0.74 | — | — | |
| SCHEMBL5563899 | 0.73 | — | — | |
| SCHEMBL7211700 | 0.73 | — | — | |
| SCHEMBL1116141 | 0.72 | — | — | |
| SCHEMBL6131431 | 0.72 | — | — | |
| SCHEMBL8383466 | 0.71 | — | — | |
| SCHEMBL3841859 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7378224-B2 | Method for forming pattern, and optical element | JSR CORPORATION (JP) | 2008-05-27 | — | — | US | disclosed |
| EP-1296186-B1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR CORP (JP) | 2006-06-07 | — | — | EP | disclosed |
| US-6852476-B2 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR CORPORATION (JP) | 2005-02-08 | — | — | US | disclosed |
| US-20050014100-A1 | Method for forming pattern, and optical element | JSR CORPORATION (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1498776-A2 | Method for forming pattern, and optical element | JSR Corporation (JP) | 2005-01-19 | — | — | EP | disclosed |
| WO-2002023274-A9 | PHOTORESIST COMPOSITION | SHIPLEY CO LLC (US) | 2003-11-13 | — | — | WO | disclosed |
| US-6645695-B2 | Crosslinked polymeric particles and a photoactive component, wherein the polymeric particles comprise cleavable group(s); free of surfactant; forming relief images | SHIPLEY COMPANY, L.L.C. | 2003-11-11 | — | — | US | disclosed |
| US-20030068574-A1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR CORPORATION (JP) | 2003-04-10 | — | — | US | disclosed |
| EP-1296186-A1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-20020051928-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-02 | — | — | US | disclosed |
| WO-2002023274-A2 | PHOTORESIST COMPOSITION | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-21 | — | — | WO | disclosed |
| EP-0338498-A2 | Process for preparing fluorine-containing copolymers | DAIKIN INDUSTRIES, LIMITED (JP) | 1989-10-25 | — | — | EP | disclosed |
| EP-0335361-A2 | Electrodeposition coating composition | KANSAI PAINT CO., LTD. (JP) | 1989-10-04 | — | — | EP | disclosed |