⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL206748 | 1.00 | — | — | |
| SCHEMBL205693 | 1.00 | — | — | |
| SCHEMBL1322274 | 1.00 | — | — | |
| SCHEMBL28471304 | 1.00 | — | — | |
| SCHEMBL25214803 | 0.98 | — | — | |
| Fluoride SCHEMBL28503240 | 0.98 | — | — | |
| Fluoride SCHEMBL30938005 | 0.98 | — | — | |
| Methyl Alcohol SCHEMBL28351401 | 0.96 | — | — | |
| Fluoride SCHEMBL29205669 | 0.96 | — | — | |
| Cyclohexane SCHEMBL29061190 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3409734-B1 | INK COMPOSITION, INK SET, AND RECORDING METHOD | SEIKO EPSON CORP (JP) | 2022-03-09 | — | — | EP | disclosed |
| US-10550277-B2 | Ink composition, ink set, and recording method | SEIKO EPSON CORPORATION (JP) | 2020-02-04 | — | — | US | disclosed |
| EP-3409734-A1 | INK COMPOSITION, INK SET, AND RECORDING METHOD | Seiko Epson Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| US-20170369721-A1 | INK COMPOSITION, INK SET, AND RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2017-12-28 | — | — | US | disclosed |
| US-7441871-B2 | Liquid-repellent member, nozzle plate, liquid-jet head using the same, and liquid-jet apparatus | SEIKO EPSON CORPORATION (JP) | 2008-10-28 | — | — | US | disclosed |
| EP-1712364-B1 | Liquid-repellent member, nozzle plate, liquid-jet head using the same, and liquid-jet apparatus | SEIKO EPSON CORP (JP) | 2008-03-26 | — | — | EP | disclosed |
| US-7267426-B2 | Liquid-repellent film-coated member, constitutive member of liquid-jet device, nozzle plate of liquid-jet head, liquid-jet head, and liquid-jet device | SEIKO EPSON CORPORATION (JP) | 2007-09-11 | — | — | US | disclosed |
| EP-1475234-B1 | Water and oil-repellent film-coated nozzle plate | SEIKO EPSON CORP (JP) | 2006-12-13 | — | — | EP | disclosed |
| US-20060244770-A1 | Liquid-repellent member, nozzle plate, liquid-jet head using the same, and liquid-jet apparatus | SEIKO EPSON CORPORATION | 2006-11-02 | — | — | US | disclosed |
| EP-1712364-A1 | Liquid-repellent member, nozzle plate, liquid-jet head using the same, and liquid-jet apparatus | SEIKO EPSON CORPORATION (JP) | 2006-10-18 | — | — | EP | disclosed |
| US-20050001879-A1 | Liquid-repellent film-coated member, constitutive member of liquid-jet device, nozzle plate of liquid-jet head, liquid-jet head, and liquid-jet device | SEIKO EPSON CORPORATION | 2005-01-06 | — | — | US | disclosed |
| EP-1475234-A1 | Water and oil-repellent film-coated nozzle plate | SEIKO EPSON CORPORATION (JP) | 2004-11-10 | — | — | EP | disclosed |