Methacrylic Acid

Methacrylic Acid

SCHEMBL4865839

C=C(C)C(=O)O.C=C(C)C(=O)OC.C=C(C)C(=O)OCCCC

nearest known ligand 0.66

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.66
ALDH1A1 P00352 3/20 0.52
THRB P10828 1/20 0.49
POLB P06746 1/20 0.47
APEX1 P27695 1/20 0.47
HTT P42858 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
HPGD P15428 2/20 0.42
ATM Q13315 1/20 0.40
HCAR2 Q8TDS4 1/20 0.40
EPHX1 P07099 1/20 0.37
ACHE P22303 6/20 0.36
RECQL P46063 1/20 0.36
NAAA Q02083 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL27388646 1.00 TSHR (0.66) TSHRALDH1A1THRBPOLBAPEX1
SCHEMBL1877021 0.95 TSHR (0.72) TSHRALDH1A1THRBPOLBAPEX1
SCHEMBL724296 0.95 TSHR (0.72) TSHRALDH1A1THRBPOLBAPEX1
Methacrylic Acid SCHEMBL8153055 0.94 TSHR (0.58) TSHRALDH1A1THRBPOLBAPEX1
Methacrylic Acid SCHEMBL9468927 0.93 TSHR (0.77) TSHRALDH1A1THRBPOLBAPEX1
Methacrylic Acid SCHEMBL11352553 0.93 TSHR (0.77) TSHRALDH1A1THRBPOLBAPEX1
Methacrylic Acid SCHEMBL8406971 0.93 TSHR (0.75) TSHRALDH1A1THRBPOLBAPEX1
Methacrylic Acid SCHEMBL462262 0.93 TSHR (0.75) TSHRALDH1A1THRBPOLBAPEX1
Methacrylic Acid SCHEMBL8427966 0.93 TSHR (0.75) TSHRALDH1A1THRBPOLBAPEX1
Methacrylic Acid SCHEMBL9422682 0.93 TSHR (0.75) TSHRALDH1A1THRBPOLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0196561-A1 Photosensitive lithographic printing plate NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1986-10-08 EP claimed
US-12032286-B2 Method for producing multi-layered type microchannel device using photosensitive resin laminate ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-07-09 US disclosed
CN-116888322-A Pretreatment composition, printing component and printing and dyeing method 日本化药株式会社 2023-10-13 CN disclosed
US-20230203223-A1 NOVEL METHACRYLATE COPOLYMER AND COMPOSITIONS COMPRISING IT EVONIK OPERATIONS GMBH (DE) 2023-06-29 US disclosed
US-20230053900-A1 METHOD FOR PRODUCING MULTI-LAYERED TYPE MICROCHANNEL DEVICE USING PHOTOSENITIVE RESIN LAMINATE ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-02-23 US disclosed
US-20200393754-A1 METHOD FOR PRODUCING MULTI-LAYERED TYPE MICROCHANNEL DEVICE USING PHOTOSENITIVE RESIN LAMINATE ASAHI KASEI KABUSHIKI KAISHA (JP) 2020-12-17 US disclosed
US-10684729-B2 Composition for forming touch panel electrode protective film, transfer film, transparent laminate, protective film for touch panel electrode and method for forming same, capacitive input device, and image display device FUJIFILM CORPORATION (JP) 2020-06-16 US disclosed
US-10649331-B2 Composition for forming touch panel electrode protective film, transfer film, laminate, protective film for touch panel electrode and method for forming same, capacitive input device, and image display device FUJIFILM CORPORATION (JP) 2020-05-12 US disclosed
CN-110554813-A Method for forming electrode protection film for touch panel, photosensitive resin composition, photosensitive element, and method for manufacturing touch panel HITACHI CHEMICAL CO LTD 2019-12-10 CN disclosed
CN-108289888-A Patch 米琪邦株式会社 2018-07-17 CN disclosed
CN-102977252-A Preparation method of MMA-BMA-MAA (methyl methacrylate-n-butyl methacrylate-methacrylic acid) ternary copolymer resin WUXI HONGHUI NEW MATERIALS TECHNOLOGY CO LTD 2013-03-20 CN disclosed
CN-1690853-B Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO LTD 2010-06-16 CN disclosed
US-7402376-B2 Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2008-07-22 US disclosed
US-20070179227-A1 VOC-free water reducible coating vehicles VOCFREE, INC. 2007-08-02 US disclosed
US-20070117892-A1 Coating composition, porous silica-based film, method for producing porous silica-based film and semiconductor device AOKI TOMOKO 2007-05-24 US disclosed
CN-1690853-A Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO LTD (JP) 2005-11-02 CN disclosed
US-20050238998-A1 Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2005-10-27 US disclosed
US-20050148711-A1 VOC free water reducible coating vehicles VOCFREE, INC. 2005-07-07 US disclosed
EP-0704761-B1 Process for forming a colored image DU PONT (US) 2000-01-12 EP disclosed
EP-0704761-A1 Process for forming a colored image E.I. DU PONT DE NEMOURS AND COMPANY (US) 1996-04-03 EP disclosed