⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL486704 | 0.84 | — | — | |
| SCHEMBL3458143 | 0.83 | — | — | |
| SCHEMBL5287396 | 0.83 | — | — | |
| SCHEMBL3457962 | 0.82 | — | — | |
| SCHEMBL5286205 | 0.82 | PTGS1 (0.31) | — | |
| SCHEMBL5283655 | 0.80 | PTGS1 (0.34) | — | |
| SCHEMBL5293914 | 0.80 | PTGS1 (0.34) | — | |
| SCHEMBL5815461 | 0.80 | PTGS1 (0.34) | — | |
| SCHEMBL5290085 | 0.80 | PTGS1 (0.34) | — | |
| SCHEMBL5289101 | 0.80 | PTGS1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240116038-A1 | ZEOLITIC MATERIAL HAVING A CHA-LIKE FRAMEWORK STRUCTURE AND SYNTHESIS OF THE SAME | BASF CORPORATION (US) | 2024-04-11 | — | — | US | claimed |
| CN-116829507-A | Zeolite material with CHA-like framework structure and synthesis thereof | 巴斯夫公司 | 2023-09-29 | — | — | CN | claimed |
| CN-101489994-B | Ionic compound | NICHICON CORP | 2013-08-28 | — | — | CN | claimed |
| US-12466956-B2 | Electroconductive resin composition and molded article of same | DENKA COMPANY LIMITED (JP) | 2025-11-11 | — | — | US | disclosed |
| EP-4585304-A1 | ADSORBENT AND PRODUCTION METHOD THEREOF | CATALER CORPORATION (JP) | 2025-07-16 | — | — | EP | disclosed |
| US-20250174409-A1 | SOLID ELECTROLYTE CAPACITOR AND METHOD FOR MANUFACTURING SAME | CARLIT CO., LTD. (JP) | 2025-05-29 | — | — | US | disclosed |
| WO-2025052748-A1 | METHOD FOR PRODUCING SOLID ELECTROLYTIC CAPACITOR | 株式会社カーリット | 2025-03-13 | — | — | WO | disclosed |
| WO-2022009445-A9 | ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED ARTICLE | 三洋化成工業株式会社 | 2025-01-16 | — | — | WO | disclosed |
| EP-4159824-B1 | ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED PRODUCT | SANYO CHEMICAL IND LTD (JP) | 2025-01-01 | — | — | EP | disclosed |
| CN-115768850-B | Antistatic agent, antistatic resin composition and molded article | 三洋化成工业株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-115698220-B | Antistatic agent, antistatic resin composition and molded article | 三洋化成工业株式会社 | 2024-05-07 | — | — | CN | disclosed |
| EP-1628334-A1 | POLISHING LIQUID FOR CMP PROCESS AND POLISHING METHOD | SANYO CHEMICAL INDUSTRIES LTD. (JP) | 2006-02-22 | — | — | EP | disclosed |
| EP-1548769-A1 | ELECTROLYTE FOR ELECTROCHEMICAL CAPACITOR AND ELECTROCHEMICAL CAPACITOR CONTAINING THE SAME | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-20050136247-A1 | Non-aqueous absorbent and use thereof | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2005-06-23 | — | — | US | disclosed |
| US-20050127319-A1 | Electrolytic solution for an electrochemical capacitor and an electrochemical capacitor using the same | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| EP-1542248-A2 | An electrolytic solution for an electrochemical capacitor and an electrochemical capacitor using the same | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2005-06-15 | — | — | EP | disclosed |
| CN-1627460-A | Electrolytic solution for an electrochemical capacitor and an electrochemical capacitor using the same | SANYO CHEMICAL IND LTD (JP) | 2005-06-15 | — | — | CN | disclosed |
| CN-1610703-A | Non-aqueous absorbent and use thereof | SANYO CHEMICAL IND LTD (JP) | 2005-04-27 | — | — | CN | disclosed |
| EP-1462460-A1 | NON-AQUEOUS ABSORBENT AND USE THEREOF | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2004-09-29 | — | — | EP | disclosed |
| US-6025457-A | POLYMERIZABLE IMIDAZOLIUM DERIVATIVE; HEAT RESISTANCE | SHIKOKU CHEMICALS CORPORATION (JP) | 2000-02-15 | — | — | US | disclosed |