Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 2/20 | 0.39 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.39 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.39 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.39 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.39 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.39 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.39 |
| ▸ | CTSK | P43235 | 1/20 | 0.35 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.30 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28839447 | 0.84 | HDAC4 (0.39) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL11216548 | 0.84 | HDAC4 (0.36) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL340678 | 0.78 | HDAC4 (0.47) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL8939555 | 0.77 | HDAC2 (0.54) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL8939554 | 0.77 | HDAC2 (0.54) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL15665965 | 0.76 | HDAC4 (0.34) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL11001766 | 0.76 | HDAC4 (0.42) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL25318618 | 0.75 | HDAC4 (0.39) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL6538023 | 0.73 | HDAC4 (0.40) | HDAC4HDAC2HDAC8HDAC6HDAC3 | |
| SCHEMBL6049107 | 0.73 | HDAC4 (0.48) | HDAC4HDAC2HDAC8HDAC6HDAC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115236939-A | Positive photoresist composition for organic insulating film of high-aperture-ratio liquid crystal display element | 烟台希尔德材料科技有限公司 | 2022-10-25 | — | — | CN | claimed |
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | claimed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | claimed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | claimed |
| US-4388434-A | ACRYLIC ESTER POLYMERS | ROHM AND HAAS COMPANY (US) | 1983-06-14 | — | — | US | claimed |
| CN-118344518-A | Acrylic resin and UV heating dual-curing adhesive and preparation method thereof | 深圳市勇泰运科技有限公司 | 2024-07-16 | — | — | CN | disclosed |
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-116376357-A | Stable printing material | 科迪华公司 | 2023-07-04 | — | — | CN | disclosed |
| CN-113423789-B | Stabilized printing material | 科迪华公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-115236939-A | Positive photoresist composition for organic insulating film of high-aperture-ratio liquid crystal display element | 烟台希尔德材料科技有限公司 | 2022-10-25 | — | — | CN | disclosed |
| CN-114245818-A | Curable composition | 佳能株式会社 | 2022-03-25 | — | — | CN | disclosed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | disclosed |
| EP-0618244-B1 | Multiple curable composition and use thereof | NAT STARCH CHEM INVEST (US) | 1998-07-15 | — | — | EP | disclosed |
| EP-0549116-B1 | Method for coating printed circuit boards | NAT STARCH CHEM INVEST (US) | 1998-02-04 | — | — | EP | disclosed |
| EP-0618244-A2 | Multiple curable composition and use thereof | W.R. GRACE & CO.-CONN. (US) | 1994-10-05 | — | — | EP | disclosed |
| US-5234970-A | Conformal coatings | W. R. GRACE & CO.-CONN. (US) | 1993-08-10 | — | — | US | disclosed |
| EP-0549116-A2 | Dual curing composition and use thereof | W.R. Grace & Co.-Conn. (US) | 1993-06-30 | — | — | EP | disclosed |