Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 3/20 | 0.70 |
| ▸ | MGAM | O43451 | 2/20 | 0.70 |
| ▸ | SI | P14410 | 2/20 | 0.70 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.42 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2790815 | 1.00 | GAA (0.70) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL516436 | 1.00 | GAA (0.70) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL398512 | 1.00 | GAA (0.70) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL28159162 | 0.97 | GAA (0.67) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL1330478 | 0.97 | — | — | |
| SCHEMBL1331762 | 0.97 | — | — | |
| SCHEMBL1332259 | 0.97 | — | — | |
| SCHEMBL1331371 | 0.97 | — | — | |
| SCHEMBL1331782 | 0.97 | — | — | |
| SCHEMBL15500 | 0.97 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20240419073-A1 | ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-12-19 | — | — | US | disclosed |
| WO-2024063135-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAM RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | 三菱ケミカル株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-11884839-B2 | Acetal-protected silanol group-containing polysiloxane composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| WO-2024005140-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL AND OPTICAL COMPONENT | 三菱ケミカル株式会社 | 2024-01-04 | — | — | WO | disclosed |
| US-11488824-B2 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-11-01 | — | — | US | disclosed |
| US-20220155688-A1 | ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-19 | — | — | US | disclosed |
| CN-111247193-B | Method for producing organopolysiloxane, radiation-curable organopolysiloxane composition, and release sheet | 信越化学工业株式会社 | 2022-04-12 | — | — | CN | disclosed |
| EP-3144139-B1 | NON-FLAMMABLE SHEET AND PRODUCTION METHOD THEREFOR | TOPPAN PRINTING CO LTD (JP) | 2021-06-23 | — | — | EP | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| US-6111044-A | CONTAINS A RESIN HAVING AT LEAST ONE FUNCTIONAL GROUP SELECTED FROM THE GROUP CONSISTING OF A BLOCKED HYDROXYL GROUP, BLOCKED CARBOXYLIC ACID, AND AN EPOXY GROUP | NOF CORPORATION (JP) | 2000-08-29 | — | — | US | disclosed |
| US-5929140-A | AN ALIPHATIC HYDROCARBON SOLVENT, AN ACRYLIC POLYMER CONTAINING LACTONE REPEATING UNIT, A POLYMER FINE PARTICLES INSOLUBLE IN ABOVE ORGANIC SOLVENT AND A CROSSLINKING AGENT; WATER RESISTANCE, WEATHERPROOFING AND CHEMICAL RESISTNCE | NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5623030-A | Curable composition and process for producing molded articles using the same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1997-04-22 | — | — | US | disclosed |
| EP-0714962-A1 | COATING RESIN COMPOSITION | NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) | 1996-06-05 | — | — | EP | disclosed |
| EP-0512562-B1 | Method of forming coating films | KANSAI PAINT CO LTD (JP) | 1995-09-27 | — | — | EP | disclosed |
| US-5393629-A | Consists of a conductive support having ligth sensitive layerc containing hydroxygallium phthalocyanine crystals as charge generating material and a charge transporting layer, and a benzidine compound | FUJI XEROX CO., LTD. (JP) | 1995-02-28 | — | — | US | disclosed |
| US-5366768-A | Method of forming coating films | KANSAI PAINT COMPANY, LIMITED (JP) | 1994-11-22 | — | — | US | disclosed |
| EP-0512562-A2 | Method of forming coating films | KANSAI PAINT CO., LTD. (JP) | 1992-11-11 | — | — | EP | disclosed |
| EP-0358238-A2 | Resin compositions and a method of curing the same | KANSAI PAINT CO., LTD. (JP) | 1990-03-14 | — | — | EP | disclosed |