⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17558050 | 0.75 | — | — | |
| SCHEMBL11339192 | 0.72 | — | — | |
| SCHEMBL11658448 | 0.72 | — | — | |
| SCHEMBL3046721 | 0.67 | — | — | |
| SCHEMBL11128391 | 0.65 | — | — | |
| SCHEMBL11128392 | 0.65 | — | — | |
| SCHEMBL21102 | 0.65 | — | — | |
| SCHEMBL14842395 | 0.65 | — | — | |
| SCHEMBL15602716 | 0.65 | — | — | |
| SCHEMBL30006426 | 0.65 | TDP1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170204290-A1 | UV-Curable Silsesquioxane-Containing Write-Through Optical Fiber Coatings For Fabrication Of Optical Fiber Bragg Gratings, And Fibers Made Therefrom | OFS FITEL, LLC (US) | 2017-07-20 | — | — | US | claimed |
| CN-104151560-B | The breathability POSS base hybrid nano-material preparation method of protection silicate cultural relic | Xi''an Jiao Tong University (CN) | 2017-01-04 | — | — | CN | claimed |
| WO-2016018918-A1 | UV-CURABLE SILSESQUIOXANE-CONTAINING WRITE-THROUGH OPTICAL FIBER COATINGS FOR FABRICATION OF OPTICAL FIBER BRAGG GRATINGS, AND FIBERS MADE THEREFROM | OFS FITEL, LLC (US) | 2016-02-04 | — | — | WO | claimed |
| CN-104151560-A | Method for preparing air-permeable POSS-based hybrid nanometer material capable of protecting silicate relics | UNIV XI AN JIAOTONG | 2014-11-19 | — | — | CN | claimed |
| US-8633292-B2 | Polyurethane-based photochromic optical materials | Signet Armorlite (US) | 2014-01-21 | — | — | US | claimed |
| EP-2411848-A1 | PLYURETHANE-BASED PHOTOCHROMIC OPTICAL MATERIALS | Signet Armorlite Inc. (US) | 2012-02-01 | — | — | EP | claimed |
| WO-2010110917-A1 | PLYURETHANE-BASED PHOTOCHROMIC OPTICAL MATERIALS | SIGNET ARMORLITE INC. (US) | 2010-09-30 | — | — | WO | claimed |
| US-20100249264-A1 | Polyurethane-based photochromic optical materials | SIGNET ARMORLITE, INC. | 2010-09-30 | — | — | US | claimed |
| US-7049044-B2 | Nanocomposite negative resists for next generation lithographies | THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 2006-05-23 | — | — | US | claimed |
| US-20060088787-A1 | NANOCOMPOSITE NEGATIVE RESISTS FOR NEXT GENERATION LITHOGRAPHIES | NATIONAL SCIENCE FOUNDATION | 2006-04-27 | — | — | US | claimed |
| US-10913873-B2 | Block copolymers with high flory-huggins interaction parameters for block copolymer lithography | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2021-02-09 | — | — | US | disclosed |
| US-10795058-B2 | Silicone-based hydrophilic copolymer and hydrogel compositions comprising the same | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2020-10-06 | — | — | US | disclosed |
| CN-110317307-A | Easy decontamination multifunction finishing agent of a kind of free-floride water repellent and the preparation method and application thereof | 北京中纺化工股份有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-106810650-B | It is a kind of with three-dimensional silane structure without fluoro water proofing agent and preparation method thereof | 北京中纺化工股份有限公司 | 2019-03-08 | — | — | CN | disclosed |
| US-20180120480-A1 | SILICONE-BASED HYDROPHILIC COPOLYMER AND HYDROGEL COMPOSITIONS COMPRISING THE SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2018-05-03 | — | — | US | disclosed |
| US-7507783-B2 | Thermally curable middle layer comprising polyhedral oligomeric silsesouioxanes for 193-nm trilayer resist process | BREWER SCIENCE INC. (US) | 2009-03-24 | — | — | US | disclosed |
| EP-1756123-A1 | PROCESS FOR MAKING HALOORGANOALKOXYSILANES | GENERAL ELECTRIC COMPANY (US) | 2007-02-28 | — | — | EP | disclosed |
| WO-2005118598-A1 | PROCESS FOR MAKING HALOORGANOALKOXYSILANES | GENERAL ELECTRIC COMPANY (US) | 2005-12-15 | — | — | WO | disclosed |
| US-20040229158-A1 | Thermally curable middle layer for 193-NM trilayer resist process | ARMY, USA BY THE SECRETARY OF THE | 2004-11-18 | — | — | US | disclosed |
| US-3953377-A | Ethyl-2-trans-4-cis undecadienoate, ethyl-2-trans-4-cis dodecadienoate and ethyl-2-decadienoate perfume compositions | FIRMENICH S.A. (CH) | 1976-04-27 | — | — | US | disclosed |