⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8656029 | 0.81 | — | — | |
| SCHEMBL9616112 | 0.70 | AKR1B1 (0.39) | — | |
| SCHEMBL21081783 | 0.69 | TDP1 (0.44) | — | |
| SCHEMBL130401 | 0.69 | — | — | |
| SCHEMBL3046723 | 0.69 | TDP1 (0.44) | — | |
| SCHEMBL10903292 | 0.69 | — | — | |
| SCHEMBL5488281 | 0.69 | — | — | |
| Isobutyraldehyde SCHEMBL15874791 | 0.69 | TDP1 (0.38) | — | |
| SCHEMBL9694267 | 0.67 | — | — | |
| SCHEMBL75764 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11041075-B2 | Self-healing composition, self-healing film, and device including the self-healing film | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-06-22 | — | — | US | claimed |
| US-20190345340-A1 | SELF-HEALING COMPOSITION, SELF-HEALING FILM, AND DEVICE INCLUDING THE SELF-HEALING FILM | SAMSUNG ELECTRONICS CO LTD (KR) | 2019-11-14 | — | — | US | claimed |
| US-20170204290-A1 | UV-Curable Silsesquioxane-Containing Write-Through Optical Fiber Coatings For Fabrication Of Optical Fiber Bragg Gratings, And Fibers Made Therefrom | OFS FITEL, LLC (US) | 2017-07-20 | — | — | US | claimed |
| CN-104151560-B | The breathability POSS base hybrid nano-material preparation method of protection silicate cultural relic | Xi''an Jiao Tong University (CN) | 2017-01-04 | — | — | CN | claimed |
| WO-2016018918-A1 | UV-CURABLE SILSESQUIOXANE-CONTAINING WRITE-THROUGH OPTICAL FIBER COATINGS FOR FABRICATION OF OPTICAL FIBER BRAGG GRATINGS, AND FIBERS MADE THEREFROM | OFS FITEL, LLC (US) | 2016-02-04 | — | — | WO | claimed |
| CN-104151560-A | Method for preparing air-permeable POSS-based hybrid nanometer material capable of protecting silicate relics | UNIV XI AN JIAOTONG | 2014-11-19 | — | — | CN | claimed |
| US-8633292-B2 | Polyurethane-based photochromic optical materials | Signet Armorlite (US) | 2014-01-21 | — | — | US | claimed |
| EP-2411848-A1 | PLYURETHANE-BASED PHOTOCHROMIC OPTICAL MATERIALS | Signet Armorlite Inc. (US) | 2012-02-01 | — | — | EP | claimed |
| WO-2010110917-A1 | PLYURETHANE-BASED PHOTOCHROMIC OPTICAL MATERIALS | SIGNET ARMORLITE INC. (US) | 2010-09-30 | — | — | WO | claimed |
| US-20100249264-A1 | Polyurethane-based photochromic optical materials | SIGNET ARMORLITE, INC. | 2010-09-30 | — | — | US | claimed |
| US-7049044-B2 | Nanocomposite negative resists for next generation lithographies | THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 2006-05-23 | — | — | US | claimed |
| US-20060088787-A1 | NANOCOMPOSITE NEGATIVE RESISTS FOR NEXT GENERATION LITHOGRAPHIES | NATIONAL SCIENCE FOUNDATION | 2006-04-27 | — | — | US | claimed |
| US-11833804-B2 | Visibility improving film for display panel and display device comprising same | LG CHEM, LTD. (KR) | 2023-12-05 | — | — | US | disclosed |
| EP-3312209-B1 | SELF-HEALING COMPOSITION, SELF-HEALING FILM, AND DEVICE INCLUDING THE SELF-HEALING FILM | SAMSUNG ELECTRONICS CO LTD (KR) | 2023-09-27 | — | — | EP | disclosed |
| EP-3809166-B1 | ANTI-REFLECTIVE FILM, POLARIZING PLATE, AND DISPLAY DEVICE | LG CHEMICAL LTD (KR) | 2023-05-31 | — | — | EP | disclosed |
| EP-3299851-B1 | ANTI-REFLECTIVE FILM AND DISPLAY DEVICE | LG CHEMICAL LTD (KR) | 2023-04-05 | — | — | EP | disclosed |
| WO-2010110917-A1 | PLYURETHANE-BASED PHOTOCHROMIC OPTICAL MATERIALS | SIGNET ARMORLITE INC. (US) | 2010-09-30 | — | — | WO | disclosed |
| US-20100075245-A1 | RESIN PARTICLE, TONER, AND IMAGE FORMING METHOD AND PROCESS CARTRIDGE USING THE SAME | RICOH COMPANY, LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| US-7507783-B2 | Thermally curable middle layer comprising polyhedral oligomeric silsesouioxanes for 193-nm trilayer resist process | BREWER SCIENCE INC. (US) | 2009-03-24 | — | — | US | disclosed |
| US-20040229158-A1 | Thermally curable middle layer for 193-NM trilayer resist process | ARMY, USA BY THE SECRETARY OF THE | 2004-11-18 | — | — | US | disclosed |