Ethylene Glycol

Ethylene Glycol

SCHEMBL4879993

C#C.C#C.C#C.C#C.OCCO

nearest known ligand 0.71

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Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.71
ALDH1A1 P00352 3/20 0.36
THRB P10828 1/20 0.33
TDP1 Q9NUW8 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL9978352 1.00
Ethylene Glycol SCHEMBL41724 1.00
Ethylene Glycol SCHEMBL27781984 1.00 TSHR (0.71) TSHRALDH1A1THRBTDP1MAPK1
Ethylene Glycol SCHEMBL3133762 1.00 TSHR (0.71) TSHRALDH1A1THRBTDP1MAPK1
Ethylene Glycol SCHEMBL9687141 1.00 TSHR (0.71) TSHRALDH1A1THRBTDP1MAPK1
Ethylene Glycol SCHEMBL17965679 0.94
Ethylene Glycol SCHEMBL2084627 0.88
Ethylene Glycol SCHEMBL3 0.84
Ethylene Glycol SCHEMBL49878 0.84
Ethylene Glycol SCHEMBL8013339 0.84 TSHR (1.00) TSHRALDH1A1TDP1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8003593-A None JP disclosed
US-20080053868-A1 ENGINE OIL COMPOSITIONS AND PREPARATION THEREOF CHEVRON U.S.A. INC. 2008-03-06 US disclosed
US-5494944-A BLEND OF MATERIAL POLYMERIZABLE BY FREE RADICAL CATALYSTAND AN IRON COMPOUND CIBA-GEIGY CORPORATION (US) 1996-02-27 US disclosed
JP-H083593-A PRODUCTION OF GRANULATED MATERIAL OF BLEACHING ACTIVATOR AND GRANULATED MATERIAL OF BLEACHING ACTIVATOR KAO CORP 1996-01-09 JP disclosed
US-5371115-A Having sensitizers, electron acceptors selected from peracids, hydroperoxides and quinones; photosensitive, photoresists CIBA-GEIGY CORPORATION (US) 1994-12-06 US disclosed
US-5124233-A PHOTORESIST COMPOSITIONS CIBA-GEIGY CORPORATION (US) 1992-06-23 US disclosed
US-4624912-A EXPOSURE TO ELECTRON OR ACTINIC RADIATION, THEN HEATING CIBA-GEIGY CORPORATION (US) 1986-11-25 US disclosed
US-4229274-A PHOTOINITIATOR, PHOTOSENSITIZER, QUENCHER, AND COMPOUNDS CONTAINING ACRYLYLOXY GROUPS PPG INDUSTRIES, INC. (US) 1980-10-21 US disclosed