SCHEMBL4883615

SCHEMBL4883615

CC(C)(C)C=O.[AlH3].[AlH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11867739 1.00
SCHEMBL2619 0.95
SCHEMBL3261673 0.95 TDP1 (0.38)
Methane SCHEMBL439621 0.90
Hydrochloric Acid SCHEMBL3253175 0.90
SCHEMBL28171075 0.90
Ammonia Solution, Strong SCHEMBL18838097 0.90
SCHEMBL28496955 0.90
SCHEMBL28556999 0.90
SCHEMBL28254587 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240120349-A1 HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES APPLIED MATERIALS, INC. 2024-04-11 US disclosed
US-11894396-B2 High-K dielectric materials comprising zirconium oxide utilized in display devices APPLIED MATERIALS, INC. (US) 2024-02-06 US disclosed
US-20230369354-A1 HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES APPLIED MATERIALS, INC. 2023-11-16 US disclosed
US-20220130873-A1 HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES APPLIED MATERIALS, INC. 2022-04-28 US disclosed
US-11239258-B2 High-k dielectric materials comprising zirconium oxide utilized in display devices APPLIED MATERIALS, INC. (US) 2022-02-01 US disclosed
US-20220013547-A1 HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES APPLIED MATERIALS, INC. 2022-01-13 US disclosed
US-11145683-B2 Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devices APPLIED MATERIALS, INC. (US) 2021-10-12 US disclosed
US-20200258918-A1 HIGH-K DIELECTRIC MATERIALS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES APPLIED MATERIALS, INC. 2020-08-13 US disclosed
US-10158098-B2 Encapsulating film stacks for OLED applications APPLIED MATERIALS, INC. (US) 2018-12-18 US disclosed
US-20180114945-A1 ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS APPLIED MATERIALS, INC. 2018-04-26 US disclosed
US-20180114946-A1 ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS APPLIED MATERIALS, INC. 2018-04-26 US disclosed
US-20180026055-A1 HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES APPLIED MATERIALS, INC. 2018-01-25 US disclosed
US-20180026054-A1 HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES APPLIED MATERIALS, INC. 2018-01-25 US disclosed
US-9847511-B2 Encapsulating film stacks for OLED applications APPLIED MATERIALS, INC. (US) 2017-12-19 US disclosed
US-20160336542-A1 ENCAPSULATING FILM STACKS FOR OLED APPLICATIONS APPLIED MATERIALS, INC. 2016-11-17 US disclosed
US-20140174532-A1 OPTIMIZED ANTI-REFLECTION COATING LAYER FOR CRYSTALLINE SILICON SOLAR CELLS APPLIED MATERIALS, INC. 2014-06-26 US disclosed
US-20080268154-A1 METHODS FOR DEPOSITING A HIGH-K DIELECTRIC MATERIAL USING CHEMICAL VAPOR DEPOSITION PROCESS APPLIED MATERIALS, INC. 2008-10-30 US disclosed