Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | TP53 | P04637 | 3/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11592647 | 0.81 | HCAR2 (0.38) | — | |
| SCHEMBL11592654 | 0.81 | HCAR2 (0.38) | — | |
| SCHEMBL11693680 | 0.81 | TSHR (0.36) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL30307070 | 0.80 | TSHR (0.38) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL11628351 | 0.80 | TSHR (0.35) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL7646494 | 0.80 | TSHR (0.35) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL11595662 | 0.79 | — | — | |
| SCHEMBL11595664 | 0.79 | — | — | |
| SCHEMBL11594380 | 0.77 | HCAR2 (0.31) | — | |
| SCHEMBL11595668 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113201089-A | All-solid-state self-repairing ion conductor, preparation method thereof and ion device | 香港中文大学（深圳） | 2021-08-03 | — | — | CN | claimed |
| US-8648160-B2 | Optical semiconductor sealing material | IDEMITSU KOSAN CO., LTD. (JP) | 2014-02-11 | — | — | US | claimed |
| EP-0824096-A2 | Process for the preparation of halogenated (meth)acrylic esters and poly (meth) arcylates obtained with said (meth)acrylic esters | Akzo Nobel N.V. (NL) | 1998-02-18 | — | — | EP | claimed |
| US-4268607-A | Method of patterning a resist layer for manufacture of a semiconductor element | VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) | 1981-05-19 | — | — | US | claimed |
| US-11912860-B2 | Highly loaded inorganic filled organic resin systems | CORNING INCORPORATED (US) | 2024-02-27 | — | — | US | disclosed |
| US-11674030-B2 | Highly loaded inorganic filled aqueous resin systems | CORNING INCORPORATED (US) | 2023-06-13 | — | — | US | disclosed |
| CN-111433268-B | Highly loaded inorganic filled waterborne resin systems | 康宁股份有限公司 | 2022-07-05 | — | — | CN | disclosed |
| CN-113201089-A | All-solid-state self-repairing ion conductor, preparation method thereof and ion device | 香港中文大学（深圳） | 2021-08-03 | — | — | CN | disclosed |
| CN-111971336-A | Highly loaded inorganic filled organic resin systems | 康宁股份有限公司 | 2020-11-20 | — | — | CN | disclosed |
| CN-111433268-A | Highly loaded inorganic filled waterborne resin systems | 康宁股份有限公司 | 2020-07-17 | — | — | CN | disclosed |
| US-8648160-B2 | Optical semiconductor sealing material | IDEMITSU KOSAN CO., LTD. (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20120305982-A1 | OPTICAL SEMICONDUCTOR SEALING MATERIAL | IDEMITSU KOSAN CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |
| EP-0490269-B1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN CO (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-5250629-A | Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts | IDEMITSU KOSAN CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0490269-A1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-06-17 | — | — | EP | disclosed |
| US-4268607-A | Method of patterning a resist layer for manufacture of a semiconductor element | VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) | 1981-05-19 | — | — | US | disclosed |
| US-4061829-A | Negative resist for X-ray and electron beam lithography and method of using same | BELL TELEPHONE LABORATORIES, INCORPORATED (US) | 1977-12-06 | — | — | US | disclosed |
| US-3954683-A | 1,2,2,2-Tetrachlorethyl acrylate and methacrylate polymers and copolymers | CESKOSLOVENSKA AKADEMIE VED (CS) | 1976-05-04 | — | — | US | disclosed |
| US-3954683-A | 1,2,2,2-Tetrachlorethyl acrylate and methacrylate polymers and copolymers | CESKOSLOVENSKA AKADEMIE VED (CS) | 1976-05-04 | — | — | US | disclosed |
| US-3882169-A | 1,2,2,2,-Tetrachlorethyl acrylate and methacrylate | CESKOSLOVENSKA AKADEMIE VED | 1975-05-06 | — | — | US | disclosed |