Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.95 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | NOS1 | P29475 | 2/20 | 0.42 |
| ▸ | NOS2 | P35228 | 2/20 | 0.42 |
| ▸ | TLR7 | Q9NYK1 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | BCHE | P06276 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29758525 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| Butylcyclohexane SCHEMBL72010 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| SCHEMBL7732902 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| SCHEMBL133013 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| Butylcyclohexane SCHEMBL2429501 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| SCHEMBL25389971 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| SCHEMBL29076378 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| SCHEMBL7741430 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| SCHEMBL134772 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT | |
| Butylcyclohexane SCHEMBL28339136 | 0.97 | CYP1A2 (1.00) | CYP1A2SIGMAR1LMNAMAPK1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11796914-B2 | Photosensitive resin structure for printing plate, and method for producing same | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-10-24 | — | — | US | disclosed |
| CN-116813649-A | Production process of n-butyllithium cyclohexane solution | 江苏新瑞药业有限公司 | 2023-09-29 | — | — | CN | disclosed |
| CN-116813649-A | Production process of n-butyllithium cyclohexane solution | 江苏新瑞药业有限公司 | 2023-09-29 | — | — | CN | disclosed |
| CN-114272883-B | Reaction unit is used in production of 2-methyl-3-trifluoromethyl aniline | 东营曜康医药科技有限公司 | 2022-06-07 | — | — | CN | disclosed |
| CN-114272883-A | Reaction unit is used in production of 2-methyl-3-trifluoromethyl aniline | 东营曜康医药科技有限公司 | 2022-04-05 | — | — | CN | disclosed |
| CN-109206422-B | Bipolar compound based on 1,3, 4-thiadiazole and preparation method and application thereof | 湖北尚赛光电材料有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-108579769-B | Composite material of layered two-dimensional material interlayer confinement metal or metal compound, preparation method and application thereof | 清华-伯克利深圳学院筹备办公室 | 2021-12-28 | — | — | CN | disclosed |
| CN-111704680-B | Tellurium-doped chitosan material | 扬州大学 | 2021-11-09 | — | — | CN | disclosed |
| EP-1811336-B2 | PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING | ASAHI KASEI CHEMICALS CORP (JP) | 2021-09-22 | — | — | EP | disclosed |
| CN-111704680-A | Tellurium-doped chitosan material | 扬州大学 | 2020-09-25 | — | — | CN | disclosed |
| US-20150175855-A1 | BLOCK COPOLYMER COMPOSITION FOR VISCOUS ADHESIVE, AND ADHESIVE COMPOSITION | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2015-06-25 | — | — | US | disclosed |
| EP-2878644-A1 | BLOCK COPOLYMER COMPOSITION FOR ADHESIVES, AND ADHESIVE COMPOSITION | Asahi Kasei Chemicals Corporation (JP) | 2015-06-03 | — | — | EP | disclosed |
| US-20080318161-A1 | Photosensitive Resin Composition for Flexographic Printing | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| EP-1811336-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING | Asahi Kasei Chemicals Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |
| US-20050004307-A1 | Hydrogenated styrene polymer resin composition and optical elements | BAYER AG (DE) | 2005-01-06 | — | — | US | disclosed |
| EP-1441007-A1 | HYDROGENATED STYRENE POLYMER RESIN COMPOSITION AND OPTICAL ELEMENTS | TEIJIN LIMITED (JP) | 2004-07-28 | — | — | EP | disclosed |
| EP-0940440-B1 | Block copolymer composition for modifying asphalt and asphalt composition comprising the same | JAPAN ELASTOMER COMPANY LTD (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-6150439-A | THE POROUS ASPHALT PARTICLES COATED WITH A COPOLYMER COMPRISING MONOALKENYL AROMATIC COMPOUND/CONJUGATED DIENE MONOMERS; EXCELLENT PHYSICAL PROPERTIES SUCH AS DUCTILITY, HIGH SOFTENING POINT, MECHANICAL STRENGTH, STORAGE STABILITY | JAPAN ELASTOMER CO., LTD. (JP) | 2000-11-21 | — | — | US | disclosed |
| CN-1232443-A | Novel p-terphenyl compounds | SHIONOGI & CO (JP) | 1999-10-20 | — | — | CN | disclosed |
| EP-0940440-A1 | Block copolymer composition for modifying asphalt and asphalt composition comprising the same | JAPAN ELASTOMER COMPANY LIMITED (JP) | 1999-09-08 | — | — | EP | disclosed |