SCHEMBL4894664

SCHEMBL4894664

CC[N+]1(COC)CCNCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4904648 0.88
SCHEMBL4903096 0.80
SCHEMBL4905435 0.78 KDM4E (0.36)
SCHEMBL1718893 0.78 KDM4E (0.33)
Iodide SCHEMBL11554005 0.78 CHRNA10 (0.33)
Fluoride Ion SCHEMBL907624 0.76 KDM4E (0.32)
Hydrochloric Acid SCHEMBL907634 0.76 KDM4E (0.32)
Water SCHEMBL1717648 0.76 KDM4E (0.32)
SCHEMBL3314119 0.76 KDM4E (0.37)
SCHEMBL3304896 0.73 CTDSP1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1867667-B1 Method for manufacturing stabilized polyacetal resin POLYPLASTICS CO (JP) 2012-10-31 EP disclosed
US-20080271381-A1 Method for manufacturing stabilized polyacetal resin, stabilized polyacetal resin, stabilized polyacetal resin composition, and molded article of stabilized polyacetal resin POLYPLASTICS CO., LTD (JP) 2008-11-06 US disclosed
EP-1867667-A1 Method for manufacturing stabilized polyacetal resin, stabilized polyacetal resin, stabilized polyacetal resin composition, and molded article of stabilized polyacetal resin Polyplastics Co., Ltd. (JP) 2007-12-19 EP disclosed