Iodide

Iodide

SCHEMBL489610

[I-].[I-].[I-].[I-].[W+4]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28005566 0.71
SCHEMBL28227086 0.71
SCHEMBL29889134 0.71
Water SCHEMBL16776762 0.71
SCHEMBL6559802 0.71
Iodide SCHEMBL8080327 0.50 CA4 (0.33)
Iodide SCHEMBL6027905 0.50
Iodide SCHEMBL19755 0.50
Iodide SCHEMBL284808 0.50
Iodide SCHEMBL335403 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 494 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260117409-A1 COMPOSITION FOR PLATING METAL COATINGS AND METHODS OF MAKING AND USING THE SAME BATTELLE MEMORIAL INSTITUTE (US) 2026-04-30 US claimed
US-20250230544-A1 DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES APPLIED MATERIALS, INC. (US) 2025-07-17 US claimed
WO-2025151418-A1 DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES APPLIED MATERIALS, INC. (US) 2025-07-17 WO claimed
CN-119461486-A Photochromic tungsten oxide sub-nanowire and preparation method and application thereof 清华大学 2025-02-18 CN claimed
CN-115747820-B Preparation method and application of porous tungsten boride catalyst 东北电力大学 2025-01-28 CN claimed
CN-113511682-B Doping WO 3 Nanowire, preparation method thereof and gas sensor 中国石油化工股份有限公司 2023-12-22 CN claimed
CN-115159574-B Preparation method and application of two-dimensional transition metal sulfur compound 中国科学院福建物质结构研究所 2023-11-17 CN claimed
CN-108987336-B Method for forming low temperature semiconductor layer and related semiconductor device structure ASM IP控股有限公司 2023-11-10 CN claimed
CN-114799161-B Method for preparing diamond tool by coating prealloyed powder for diamond tool with nano tungsten carbide particles 中国科学院过程工程研究所 2023-05-09 CN claimed
CN-115747820-A Preparation method and application of porous tungsten boride catalyst 东北电力大学 2023-03-07 CN claimed
US-20130201477-A1 ELEMENTARY ANALYSIS APPARATUS AND METHOD HITACHI HIGH-TECHNOLOGIES CORPORATION (JP) 2013-08-08 US claimed
US-20120091406-A1 NANOCRYSTAL-METAL OXIDE-POLYMER COMPOSITES AND PREPARATION METHOD THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-04-19 US claimed
US-7365028-B2 Methods of forming metal oxide and semimetal oxide MICRON TECHNOLOGY, INC. (US) 2008-04-29 US claimed
US-20060024881-A1 Methods of forming metal oxide and semimetal oxide MICRON TECHNOLOGY, INC. 2006-02-02 US claimed
US-6176936-B1 In-situ chamber cleaning method of CVD apparatus NEC CORPORATION (JP) 2001-01-23 US claimed
EP-0369796-B1 Production of alfa-olefin polymers MITSUBISHI PETROCHEMICAL CO (JP) 1994-01-26 EP claimed
US-5032563-A ZIEGLER POLYMERIZATION CATALYST MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1991-07-16 US claimed
EP-0369796-A2 Production of alfa-olefin polymers MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1990-05-23 EP claimed
EP-0316887-A2 Method for preparing cycloolefin copolymers with improved heat stability THE B.F. GOODRICH COMPANY (US) 1989-05-24 EP claimed
US-4125857-A Field sequential color television camera arrangements ELLIOTT BROTHERS (LONDON) LIMITED (GB) 1978-11-14 US claimed