Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL29158384 | 0.82 | — | — | |
| Iodide SCHEMBL29158317 | 0.82 | — | — | |
| SCHEMBL28005566 | 0.71 | — | — | |
| SCHEMBL30020208 | 0.71 | — | — | |
| SCHEMBL28227086 | 0.71 | — | — | |
| SCHEMBL28829693 | 0.71 | — | — | |
| SCHEMBL29447246 | 0.71 | — | — | |
| SCHEMBL7649903 | 0.71 | — | — | |
| Water SCHEMBL16776762 | 0.71 | — | — | |
| Iodide SCHEMBL19755 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 820 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260068255-A1 | SEMICONDUCTOR STRUCTURE WITH SIDEWALL-FREE DIPOLE METAL FEATURE AND METHOD FOR MANUFACTURING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-05 | — | — | US | claimed |
| US-20260031346-A1 | CATHODE MATERIAL CONTAINING HALOGEN-OXYGEN COMPOUND, METHOD FOR PREPARING SAME, AND CATHODE PLATE | Eastern Institute for Advanced Study (CN) | 2026-01-29 | — | — | US | claimed |
| US-20250230544-A1 | DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES | APPLIED MATERIALS, INC. (US) | 2025-07-17 | — | — | US | claimed |
| WO-2025151418-A1 | DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES | APPLIED MATERIALS, INC. (US) | 2025-07-17 | — | — | WO | claimed |
| CN-119843129-A | Niobium-hafnium alloy material and preparation method and application thereof | 韩伴祥 | 2025-04-18 | — | — | CN | claimed |
| CN-118993142-A | Synthetic method of hafnium dioxide quantum dot | 温州大学 | 2024-11-22 | — | — | CN | claimed |
| CN-118954616-A | Positive electrode material containing amorphous halogen-oxygen compound and preparation method and application thereof | 宁波市东方理工高等研究院 | 2024-11-15 | — | — | CN | claimed |
| CN-118955345-A | Novel ionizable lipid compound, and preparation method and application thereof | 安徽普利药业有限公司 | 2024-11-15 | — | — | CN | claimed |
| CN-118685659-A | Preparation method of high-purity amorphous alloy master alloy | 东莞市逸昊金属材料科技有限公司 | 2024-09-24 | — | — | CN | claimed |
| CN-118320764-A | Device system and method for preparing tetraalkyl amino hafnium and trialkyl amino hafnium metallocene | 天津绿菱气体股份有限公司 | 2024-07-12 | — | — | CN | claimed |
| US-6657067-B2 | Oxidation of 4-chloro-o-xylene in acetic acid and presence of sources of cobalt, manganese, zirconium, hafnium, and/or bromide to form chlorophthalic acid; copolymerizing to polyetherimides; imidation | GENERAL ELECTRIC COMPANY | 2003-12-02 | — | — | US | claimed |
| US-6649773-B2 | Liquid phase oxidation of halo-ortho-xylene in acetic acid using catalyst containing cobalt, manganese, zirconium and/or hafnium, and bromide at elevated temperature and pressure, dehydrating halophthalic acid formed to anhydride | GENERAL ELECTRIC COMPANY | 2003-11-18 | — | — | US | claimed |
| WO-2003082791-A1 | LIQUID PHASE OXIDATION OF HALOGENATED ORTHO-XYLENES | GENERAL ELECTRIC COMPANY (US) | 2003-10-09 | — | — | WO | claimed |
| US-20030181758-A1 | METHOD FOR THE MANUFACTURE OF HALOPHTHALIC ACIDS AND ANHYDRIDES | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2003-09-25 | — | — | US | claimed |
| US-20030181757-A1 | LIQUID PHASE OXIDATION OF HALOGENATED ORTHO-XYLENES | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2003-09-25 | — | — | US | claimed |
| US-20030181756-A1 | METHOD FOR THE MANUFACTURE OF CHLOROPHTHALIC ANHYDRIDE | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2003-09-25 | — | — | US | claimed |
| US-6348386-B1 | Method for making a hafnium-based insulating film | MOTOROLA, INC. | 2002-02-19 | — | — | US | claimed |
| US-6016031-A | High luminance electrodeless projection lamp | OSRAM SYLVANIA INC. (US) | 2000-01-18 | — | — | US | claimed |
| EP-0897190-A2 | High luminance electrodeless projection lamp | OSRAM SYLVANIA INC. (US) | 1999-02-17 | — | — | EP | claimed |
| US-5726264-A | ETHYLENE-BRIDGED-METALLOCENE-TRANSITION METAL COMPOUND | PHILLIPS PETROLEUM COMPANY (US) | 1998-03-10 | — | — | US | claimed |