SCHEMBL489993

SCHEMBL489993

CC1(C)C(C)(C)C(C)(C)C(C)(C)C1(C)C.[SiH3]O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2802642 1.00
SCHEMBL342505 0.74
SCHEMBL14973382 0.74
SCHEMBL14973298 0.74
SCHEMBL2396940 0.74
SCHEMBL6346380 0.71
Fluoride SCHEMBL3459832 0.68
Ethane SCHEMBL11832076 0.68
Fluoride SCHEMBL3458737 0.68
Fluoride SCHEMBL3459423 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220001443-A1 POWDER DISPERSION COMPOSITION AND DISPERSING METHOD THEREOF SHISEIDO COMPANY, LTD. (JP) 2022-01-06 US disclosed
US-20220000758-A1 COSMETIC SHISEIDO COMPANY, LTD. (JP) 2022-01-06 US disclosed
EP-3881899-A1 COSMETIC Shiseido Company, Ltd. (JP) 2021-09-22 EP disclosed
EP-3881820-A1 POWDER DISPERSION COMPOSITION AND DISPERSING METHOD THEREOF Shiseido Company, Ltd. (JP) 2021-09-22 EP disclosed
EP-1914264-B1 SURFACE-TREATED POWDER AND COSMETIC COMPRISING THE SAME MIYOSHI KASEI INC (JP) 2018-08-29 EP disclosed
EP-1797967-B1 METHOD FOR ORGANIC THIN FILM FORMATION NIPPON SODA CO (JP) 2017-09-13 EP disclosed
EP-1688126-B1 GLYCYLGLYCINE AS PARAKERATOSIS INHIBITOR SHISEIDO CO LTD (JP) 2017-08-23 EP disclosed
EP-1880711-B1 Parakeratosis inhibitor, pore-shrinking agent and external composition for skin SHISEIDO CO LTD (JP) 2016-07-20 EP disclosed
US-8937090-B2 Parakeratosis inhibitor, pore-shrinking agent and external composition for skin SHISEIDO COMPANY, LTD. (JP) 2015-01-20 US disclosed
US-8741526-B2 Developer SEIKO EPSON CORPORATION (JP) 2014-06-03 US disclosed
EP-1484105-A1 METHOD FOR PREPARING CHEMICAL ADSORPTION FILM AND SOLUTION FOR PREPARING CHEMICAL ADSORPTION FILM FOR USE THEREIN NIPPON SODA CO., LTD. (JP) 2004-12-08 EP disclosed
US-20040197254-A1 Dispersed ingredient having metal-oxygen NIPPON SODA CO., LTD. (JP) 2004-10-07 US disclosed
EP-1422197-A1 DISPERSED INGREDIENT HAVING METAL&amp;minus;OXYGEN NIPPON SODA CO., LTD. (JP) 2004-05-26 EP disclosed
US-6676932-B2 CONTAINING PYRIDAZINE DERIVATIVE SUNSCREEN AGENT SHISEIDO CO., LTD. (JP) 2004-01-13 US disclosed
US-20030104969-A1 Laundry system having unitized dosing PROCTER & GAMBLE COMPANY,THE 2003-06-05 US disclosed
EP-1297101-A2 LAUNDRY SYSTEM HAVING UNITIZED DOSING THE PROCTER & GAMBLE COMPANY (US) 2003-04-02 EP disclosed
US-6528068-B1 An oily material for cosmetic compositions which oily material is an N-long-chain acyl neutral amino acid ester containing a straight-chain or branched-chain, saturated or unsaturated acyl group having from 6 to 22 carbon atoms, where the AJINOMOTO CO., INC. (JP) 2003-03-04 US disclosed
EP-1266651-A2 UV absorbing and photostabilizing agents and compositions and external preparation for skin SHISEIDO COMPANY LIMITED (JP) 2002-12-18 EP disclosed
WO-2001085888-A2 LAUNDRY SYSTEM HAVING UNITIZED DOSING THE PROCTER & GAMBLE COMPANY (US) 2001-11-15 WO disclosed
EP-0928608-A2 Cosmetic composition Ajinomoto Co., Inc. (JP) 1999-07-14 EP disclosed