⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14518179 | 1.00 | — | — | |
| SCHEMBL10535507 | 0.91 | TSHR (0.41) | — | |
| SCHEMBL6556198 | 0.86 | TSHR (0.46) | — | |
| Alcohol SCHEMBL6689651 | 0.86 | TSHR (0.50) | — | |
| SCHEMBL181160 | 0.85 | TSHR (0.55) | — | |
| SCHEMBL26766 | 0.85 | — | — | |
| SCHEMBL184957 | 0.85 | — | — | |
| SCHEMBL337233 | 0.82 | TSHR (0.52) | — | |
| Charcoal, Activated SCHEMBL30078180 | 0.82 | TSHR (0.52) | — | |
| SCHEMBL6557046 | 0.82 | TSHR (0.52) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| EP-3661901-B1 | SYNTHESIS OF GLYCOLS VIA TRANSFER HYDROGENATION OF ALPHA-FUNCTIONAL ESTERS WITH ALCOHOLS | EASTMAN CHEM CO (US) | 2023-12-06 | — | — | EP | disclosed |
| US-20230384674-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230367212-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-11780832-B2 | Lactivicin compounds, their preparation and use as antibacterial agents | FEDORA PHARMACEUTICALS INC. (CA) | 2023-10-10 | — | — | US | disclosed |
| US-20230259029-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| US-20230236502-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-27 | — | — | US | disclosed |
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20030148130-A1 | Surface appearance, good flexibility and good resistance to poor weather conditions. | MOENS LUC (BE) | 2003-08-07 | — | — | US | disclosed |
| US-6461742-B1 | THERMOSETTING POWDER COMPOSITION, COMPRISING BETA-HYDROXYALKYLAMIDE CROSSLINKING AGENT AND POLYESTER HAVING TERMINAL TERTIARY CARBOXYL GROUPS, HAVING SPECIFIED ACID NUMBER | UCB, S.A. (BE) | 2002-10-08 | — | — | US | disclosed |
| CN-1293686-A | Polyester containing tertiary carboxyl groups, preparation method and thermosetting powder compositions containing same | UCB SA (BE) | 2001-05-02 | — | — | CN | disclosed |
| EP-0910351-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. Searle & Co. (US) | 1999-04-28 | — | — | EP | disclosed |
| EP-0907666-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. Searle & Co. (US) | 1999-04-14 | — | — | EP | disclosed |
| WO-1997049736-A2 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. SEARLE AND CO. (US) | 1997-12-31 | — | — | WO | disclosed |
| WO-1997049387-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. SEARLE AND CO. (US) | 1997-12-31 | — | — | WO | disclosed |
| US-5183492-A | Herbicides as enol ethers | CIBA-GEIGY CORPORATION (US) | 1993-02-02 | — | — | US | disclosed |
| US-4476276-A | HERBICIDE, PLANT GROWTH REGULATOR | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-10-09 | — | — | US | disclosed |
| US-4315703-A | Sealing method using latex-reinforced polyurethane sewer sealing composition | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1982-02-16 | — | — | US | disclosed |