SCHEMBL4910123

SCHEMBL4910123

O[SiH2]O[Si](O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18365311 0.75
SCHEMBL18365314 0.75
SCHEMBL18530935 0.69
SCHEMBL170189 0.69
SCHEMBL17546227 0.69
SCHEMBL131162 0.68
SCHEMBL15899089 0.65
SCHEMBL4446281 0.64
SCHEMBL1164640 0.64
SCHEMBL15693307 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0362145-B1 Crosslinked siloxane-urethane polymer contact lens CIBA GEIGY AG (CH) 1996-01-03 EP claimed
US-5426158-A Interpenetrating polymer network with vinyl polymer CIBA-GEIGY CORP. (US) 1995-06-20 US claimed
US-4983702-A Crosslinked siloxane-urethane polymer contact lens CIBA-GEIGY CORPORATION (US) 1991-01-08 US claimed
EP-0362145-A2 Crosslinked siloxane-urethane polymer contact lens CIBA-GEIGY AG (CH) 1990-04-04 EP claimed
WO-2025089213-A1 SILICA PARTICLES HAVING IMPROVED HYDROPHOBICITY, AND COMPOSITION FOR COATING ENAMEL WIRE 日産化学株式会社 2025-05-01 WO disclosed
WO-2025089210-A1 SILICA PARTICLES HAVING CARBOXYL GROUP AND HYDROPHOBIC GROUP, AND COMPOSITION FOR COATING ENAMEL WIRE 日産化学株式会社 2025-05-01 WO disclosed
WO-2025084429-A1 SILICA PARTICLES FOR COATING COMPOSITION AND LAMINATED SUBSTRATE 日産化学株式会社 2025-04-24 WO disclosed
US-10283528-B2 Thin film transistor array panel, liquid crystal display including the same, and manufacturing method thereof SAMSUNG DISPLAY CO., LTD. (KR) 2019-05-07 US disclosed
US-10030113-B2 Gas barrier film and method for producing it DAI NIPPON PRINTING CO., LTD. (JP) 2018-07-24 US disclosed
US-20170009034-A1 GAS BARRIER FILM AND METHOD FOR PRODUCING IT DAI NIPPON PRINTING CO., LTD. (JP) 2017-01-12 US disclosed
US-9470978-B2 Solution composition for passivation layer, thin film transistor array panel, and manufacturing method for thin film transistor array panel SAMSUNG DISPLAY CO., LTD. (KR) 2016-10-18 US disclosed
US-20160300860-A1 THIN FILM TRANSISTOR ARRAY PANEL, LIQUID CRYSTAL DISPLAY INCLUDING THE SAME, AND MANUFACTURING METHOD THEREOF SAMSUNG DISPLAY CO., LTD. (KR) 2016-10-13 US disclosed
US-20150050597-A1 SOLUTION COMPOSITION FOR PASSIVATION LAYER, THIN FILM TRANSISTOR ARRAY PANEL, AND MANUFACTURING METHOD FOR THIN FILM TRANSISTOR ARRAY PANEL SAMSUNG DISPLAY CO LTD (KR) 2015-02-19 US disclosed
US-8890139-B2 Solution composition for passivation layer, thin film transistor array panel, and manufacturing method for thin film transistor array panel SAMSUNG DISPLAY CO., LTD. (KR) 2014-11-18 US disclosed
US-20130099228-A1 SOLUTION COMPOSITION FOR PASSIVATION LAYER, THIN FILM TRANSISTOR ARRAY PANEL, AND MANUFACTURING METHOD FOR THIN FILM TRANSISTOR ARRAY PANEL SAMSUNG DISPLAY CO., LTD. (KR) 2013-04-25 US disclosed
US-20080041273-A1 Scratchproof, Radiation-Curable Coatings BASF COATINGS AKTIENGESELLSCHAFT (DE) 2008-02-21 US disclosed
EP-0362145-B1 Crosslinked siloxane-urethane polymer contact lens CIBA GEIGY AG (CH) 1996-01-03 EP disclosed
US-5426158-A Interpenetrating polymer network with vinyl polymer CIBA-GEIGY CORP. (US) 1995-06-20 US disclosed
US-4983702-A Crosslinked siloxane-urethane polymer contact lens CIBA-GEIGY CORPORATION (US) 1991-01-08 US disclosed
EP-0362145-A2 Crosslinked siloxane-urethane polymer contact lens CIBA-GEIGY AG (CH) 1990-04-04 EP disclosed