SCHEMBL491132

SCHEMBL491132

CCN1C(=CC=C2CCC(C=CC3=[N+](CC)c4ccc(Cl)cc4C3(C)C)=C2N(c2ccccc2)c2ccccc2)C(C)(C)c2cc(Cl)ccc21

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRMT1 Q99873 7/20 0.48
MEN1 O00255 1/20 0.47
NPC1 O15118 1/20 0.47
USP2 O75604 1/20 0.47
S1PR2 O95136 1/20 0.47
LMNA P02545 1/20 0.47
POLB P06746 1/20 0.47
MAPT P10636 1/20 0.47
ALPG P10696 1/20 0.47
THRB P10828 1/20 0.47
PKM P14618 1/20 0.47
XBP1 P17861 1/20 0.47
CRHBP P24387 1/20 0.47
HTT P42858 1/20 0.47
RECQL P46063 1/20 0.47
RAB9A P51151 1/20 0.47
BLM P54132 1/20 0.47
KMT2A Q03164 1/20 0.47
CRHR2 Q13324 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL93084 1.00 PRMT1 (0.48) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL491131 1.00 PRMT1 (0.48) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL12609404 0.96 MEN1 (0.46) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL24044665 0.96 MEN1 (0.46) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL25837225 0.96 PRMT1 (0.48) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL12863730 0.95 PRMT1 (0.51) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL16791360 0.92 PRMT1 (0.42) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL13930326 0.92 PRMT1 (0.41) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL860213 0.92 MEN1 (0.47) PRMT1MEN1NPC1USP2S1PR2
SCHEMBL14220672 0.92 PRMT1 (0.45) PRMT1MEN1NPC1USP2S1PR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1917141-B1 DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER KODAK GRAPHIC COMM GMBH (DE) 2012-12-12 EP disclosed
US-8105755-B2 Method for processing of photopolymer printing plates with overcoat EASTMAN KODAK COMPANY (US) 2012-01-31 US disclosed
EP-1868036-B1 Method for processing of photopolymer printing plates with overcoat EASTMAN KODAK CO (US) 2010-09-22 EP disclosed
US-7781148-B2 Substrate with hydrophilic surface, polymer soluble or swellable in aqueous alkaline developer and solvent KODAK GRAPHIC COMMUNICATIONS, GMBH (DE) 2010-08-24 US disclosed
US-20090148794-A1 METHOD FOR PROCESSING OF PHOTOPOLYMER PRINTING PLATES WITH OVERCOAT LASER PACIFIC MEDIA CORPORATION 2009-06-11 US disclosed
US-20080206674-A1 Substrate with hydrophilic surface, polymer soluble or swellable in aqueous alkaline developer and solvent KODAK GRAPHIC COMMUNICATION GMBH (DE) 2008-08-28 US disclosed
EP-1917141-A2 DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER Kodak Graphic Communications GmbH (DE) 2008-05-07 EP disclosed
EP-1884359-A1 Dual-layer heat-sensitive imageable elements with phosphorous containing polymers in the top layer EASTMAN KODAK COMPANY (US) 2008-02-06 EP disclosed
EP-1868036-A1 Method for processing of photopolymer printing plates with overcoat EASTMAN KODAK COMPANY (US) 2007-12-19 EP disclosed
EP-1223196-B1 Negative image-recording material and cyanine dye FUJIFILM CORP (JP) 2007-09-12 EP disclosed
WO-2007017162-A2 DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2007-02-15 WO disclosed