⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13006360 | 1.00 | — | — | |
| SCHEMBL491681 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL11441382 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL11441384 | 0.94 | — | — | |
| SCHEMBL8520990 | 0.75 | — | — | |
| SCHEMBL8520988 | 0.75 | — | — | |
| SCHEMBL18653446 | 0.73 | — | — | |
| SCHEMBL3240594 | 0.71 | — | — | |
| SCHEMBL12330793 | 0.71 | — | — | |
| SCHEMBL3240599 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 572 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250129196-A1 | PHOTOCURABLE COMPOSITIONS AND METHOD OF MANUFACTURING DISPLAY DEVICE | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-04-24 | — | — | US | claimed |
| CN-117810541-A | Nonaqueous magnesium electrolyte and preparation method thereof | 青岛科技大学 | 2024-04-02 | — | — | CN | claimed |
| US-9785079-B2 | Digital printing apparatus and digital printing process | XEIKON MANUFACTURING N.V. (BE) | 2017-10-10 | — | — | US | claimed |
| US-20160291496-A1 | Digital Printing Apparatus and Digital Printing Process | XEIKON IP BV (NL) | 2016-10-06 | — | — | US | claimed |
| EP-3014360-A1 | DIGITAL PRINTING APPARATUS AND DIGITAL PRINTING PROCESS | Xeikon IP B.V. (NL) | 2016-05-04 | — | — | EP | claimed |
| WO-2014209108-A1 | DIGITAL PRINTING APPARATUS AND DIGITAL PRINTING PROCESS | XEIKON IP BV (NL) | 2014-12-31 | — | — | WO | claimed |
| US-7652128-B2 | Toner composition | XEROX CORPORATION (US) | 2010-01-26 | — | — | US | claimed |
| US-20090142692-A1 | LOW MOLECULAR WEIGHT LATEX AND TONER COMPOSITIONS COMPRISING THE SAME | XEROX CORPORATION (US) | 2009-06-04 | — | — | US | claimed |
| US-20060286476-A1 | manufactured under monomer-starved polymerization condition such as monomer feeding rate equal to or less than 0.516% per minute by weight of the monomer(s) to be fed; gloss, fusing performance, crease performance, stripping performance, document offset, vinyl offset, and parent charging etc. | XEROX CORPORATION | 2006-12-21 | — | — | US | claimed |
| US-20060100300-A1 | Toner composition | XEROX CORPORATION | 2006-05-11 | — | — | US | claimed |
| EP-0682674-A1 | PERFLUOROALKYL SULFIDE POLYMER SOLVENTS FOR FLUOROMONOMER POLYMERIZATION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-11-22 | — | — | EP | claimed |
| WO-1994018248-A1 | PERFLUOROALKYL SULFIDE POLYMER SOLVENTS FOR FLUOROMONOMER POLYMERIZATION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-08-18 | — | — | WO | claimed |
| EP-0060808-B1 | 4-CHLORO-4-CHLOROMETHYLOXETAN-2-ONE AND PROCESS FOR ITS PREPARATION | CIBA-GEIGY AG (CH) | 1985-07-24 | — | — | EP | claimed |
| US-4398033-A | 4-Chloro-4-chloromethyloxetan-2-one and a process for its production | CIBA-GEIGY CORPORATION (US) | 1983-08-09 | — | — | US | claimed |
| EP-0060808-A2 | 4-Chloro-4-chloromethyloxetan-2-one and process for its preparation | CIBA-GEIGY AG (CH) | 1982-09-22 | — | — | EP | claimed |
| EP-4045544-B1 | SUPER ADVANCED CONTROLLED RADICAL POLYMERIZATION | BASF COATINGS GMBH (DE) | 2026-03-18 | — | — | EP | disclosed |
| US-12534561-B2 | Controlled radical polymerization | BASF COATINGS GMBH (DE) | 2026-01-27 | — | — | US | disclosed |
| US-4069377-A | Polymerization of ethylenically unsaturated monomers employing secondary-aliphatic α-substituted azoalkanes | PENNWALT CORPORATION | 1978-01-17 | — | — | US | disclosed |
| US-4049634-A | ACRYLOYL OR METHACRYLOYL CONTAINING OLIGOMER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JA) | 1977-09-20 | — | — | US | disclosed |
| US-4025502-A | POLYMERIZATION CATALYSTS, CURING AGENTS | PENNWALT CORPORATION (US) | 1977-05-24 | — | — | US | disclosed |