SCHEMBL491940

SCHEMBL491940

C=C[SiH](Cl)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL388978 0.74
SCHEMBL27694975 0.70
SCHEMBL308507 0.67
SCHEMBL2468917 0.67
Vinyl Chloride SCHEMBL29247763 0.63
SCHEMBL28805283 0.61
Butadiene SCHEMBL21382085 0.57
SCHEMBL238357 0.56
SCHEMBL9510100 0.53
SCHEMBL8393010 0.53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 483 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2933353-A1 Use of silicon and carbon precursors for producing fiber-reinforced composites L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2015-10-21 EP claimed
US-7053030-B2 Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-05-30 US claimed
US-20040171761-A1 Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-09-02 US claimed
US-20250257240-A1 High Performance Silicon-Based Coating Compositions BURNING BUSH GROUP, LLC (US) 2025-08-14 US disclosed
US-12122936-B2 High performance silicon-based coating compositions BURNING BUSH GROUP LLC (US) 2024-10-22 US disclosed
EP-2547528-B1 LIQUID DROPLET EJECTING METHOD, LIQUID DROPLET EJECTION APPARATUS, INKJET RECORDING APPARATUS, PRODUCTION METHOD OF FINE PARTICLES, FINE PARTICLE PRODUCTION APPARATUS, AND TONER RICOH CO LTD (JP) 2024-05-08 EP disclosed
CN-114206815-B Halogenated tetrasilylborates 瓦克化学股份公司 2024-03-08 CN disclosed
US-20240043717-A1 HIGH PERFORMANCE SILICON-BASED COATING COMPOSITIONS BURNING BUSH GROUP, LLC 2024-02-08 US disclosed
CN-116897037-A Agent for dyeing keratin materials comprising at least two organosilicon compounds different from each other, at least one pigment and at least one liquid fatty component and/or solvent 汉高股份有限及两合公司 2023-10-17 CN disclosed
US-11773290-B2 Method for applying high performance silicon-based coating compositions BURNING BUSH GROUP, LLC (US) 2023-10-03 US disclosed
CN-116829121-A By a process comprising organic C 1 -C 6 Method for treating human hair with an agent of an alkoxysilane mixture 汉高股份有限及两合公司 2023-09-29 CN disclosed
EP-0488729-A1 Developer for developing electrostatic image, image forming method, toner image fixing method and image forming apparatus CANON KABUSHIKI KAISHA (JP) 1992-06-03 EP disclosed
EP-0461672-A2 Image forming apparatus. CANON KABUSHIKI KAISHA (JP) 1991-12-18 EP disclosed
CN-1049064-A Image device CANON KK (JP) 1991-02-06 CN disclosed
CN-1049063-A Image device CANON KK (JP) 1991-02-06 CN disclosed
EP-0410483-A1 Developer for developing electrostatic images and image forming apparatus CANON KABUSHIKI KAISHA (JP) 1991-01-30 EP disclosed
EP-0410457-A2 Image forming apparatus CANON KABUSHIKI KAISHA (JP) 1991-01-30 EP disclosed
EP-0410456-A2 Image forming apparatus CANON KABUSHIKI KAISHA (JP) 1991-01-30 EP disclosed
EP-0410482-A2 Image forming apparatus CANON KABUSHIKI KAISHA (JP) 1991-01-30 EP disclosed
EP-0395061-A2 Image forming method and image forming apparatus CANON KABUSHIKI KAISHA (JP) 1990-10-31 EP disclosed