⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Charcoal, Activated SCHEMBL1049306 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL8144403 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL2431514 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL60093 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL1680027 | 0.82 | — | — | |
| Charcoal, Activated SCHEMBL455098 | 0.82 | — | — | |
| Charcoal, Activated SCHEMBL4001743 | 0.82 | — | — | |
| Charcoal, Activated SCHEMBL2638581 | 0.82 | — | — | |
| Charcoal, Activated SCHEMBL135385 | 0.82 | — | — | |
| Barium SCHEMBL3789639 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 226 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118073199-A | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2024-05-24 | — | — | CN | claimed |
| US-20230009077-A1 | CONTACT STRUCTURES IN SEMICONDUCTOR DEVICES | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-01-12 | — | — | US | claimed |
| CN-106834765-B | A method of preparing silicon-containing alloy with the silicon carbide cutting waste material of crystalline silicon | 东北大学 | 2018-10-23 | — | — | CN | claimed |
| CN-107686369-A | A kind of method for preparing carborundum porous ceramics with the carborundum cutting waste material of crystalline silicon | 东北大学 | 2018-02-13 | — | — | CN | claimed |
| CN-104962716-B | Gas catalysis nonflame near-infrared heating anneal stove | 周海波 | 2017-08-25 | — | — | CN | claimed |
| CN-106834765-A | A kind of method for preparing silicon-containing alloy with the carborundum cutting waste material of crystalline silicon | 东北大学 | 2017-06-13 | — | — | CN | claimed |
| CN-204874638-U | Nearly infrared heating of gas catalysis nonflame stove of annealing | ZHOU HAIBO | 2015-12-16 | — | — | CN | claimed |
| CN-104964281-A | Fuel-gas-catalyzed flameless near-infrared indirect heating porous medium burner | ZHOU HAIBO | 2015-10-07 | — | — | CN | claimed |
| CN-104962716-A | Gas catalytic flameless near-infrared heating annealing furnace | ZHOU HAIBO | 2015-10-07 | — | — | CN | claimed |
| CN-104930513-A | Fuel-gas-catalyzing flameless near-infrared direct heating porous medium combustor | ZHOU HAIBO | 2015-09-23 | — | — | CN | claimed |
| CN-103831708-A | Spring end grinding machine with protection device | WAFIOS AG | 2014-06-04 | — | — | CN | claimed |
| US-8481423-B2 | Methods to mitigate plasma damage in organosilicate dielectrics | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-09 | — | — | US | claimed |
| US-7781332-B2 | Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-24 | — | — | US | claimed |
| US-20090075472-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-19 | — | — | US | claimed |
| US-20090072401-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS USING A PROTECTIVE SIDEWALL SPACER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-19 | — | — | US | claimed |
| EP-1262233-B1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | SUMITOMO CHEMICAL CO (JP) | 2006-07-19 | — | — | EP | claimed |
| US-6881697-B1 | Process for producing titanium-containing silicon oxide catalyst, the catalyst, and process for producing oxirane compound with the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-04-19 | — | — | US | claimed |
| EP-1262233-A1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | Sumitomo Chemical Company, Limited (JP) | 2002-12-04 | — | — | EP | claimed |
| US-4377677-A | Method of preparing polycarbosilanes | UBE INDUSTRIES, LTD. (JP) | 1983-03-22 | — | — | US | claimed |
| JP-3295881-A | — | — | None | — | — | JP | disclosed |
| CN-119560509-A | Sandwich structure MCMB@Si@C silicon carbon anode material and preparation method and application thereof | 龙子湖新能源实验室 | 2025-03-04 | — | — | CN | disclosed |
| CN-119560509-A | Sandwich structure MCMB@Si@C silicon carbon anode material and preparation method and application thereof | 龙子湖新能源实验室 | 2025-03-04 | — | — | CN | disclosed |
| EP-3721489-B1 | COMPOSITE COMPRISING SILICON CARBIDE AND CARBON PARTICLES | ENEVATE CORP (US) | 2024-05-29 | — | — | EP | disclosed |
| CN-118073199-A | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2024-05-24 | — | — | CN | disclosed |
| US-20240136438-A1 | INNER SPACERS FOR GATE-ALL-AROUND SEMICONDUCTOR DEVICES | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-04-25 | — | — | US | disclosed |
| CN-220361026-U | Device for treating organosilicon slag slurry | 宁波银瑞有机硅科技发展有限公司 | 2024-01-19 | — | — | CN | disclosed |
| US-20240006584-A1 | SILICON PARTICLES FOR BATTERY ELECTRODES | ENEVATE CORPORATION | 2024-01-04 | — | — | US | disclosed |
| US-11855214-B2 | Inner spacers for gate-all-around semiconductor devices | TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD. (TW) | 2023-12-26 | — | — | US | disclosed |
| US-20230387393-A1 | Surface Modification of Silicon Particles for Electrochemical Storage | ENEVATE CORP (US) | 2023-11-30 | — | — | US | disclosed |
| CN-116995210-A | Composite comprising silicon carbide and carbon particles | 新强能电池公司 | 2023-11-03 | — | — | CN | disclosed |
| CN-116917535-A | Selective deposition of silicon dielectric films | 弗萨姆材料美国有限责任公司 | 2023-10-20 | — | — | CN | disclosed |
| EP-2739670-B1 | SOL-GEL DERIVED COMPOSITIONS | ABS MAT INC (US) | 2023-10-11 | — | — | EP | disclosed |
| US-11777077-B2 | Silicon particles for battery electrodes | ENEVATE CORPORATION (US) | 2023-10-03 | — | — | US | disclosed |
| CN-219663941-U | Organosilicon waste recycling device | 枣阳市华威硅氟材料有限公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-113448157-B | wavelength conversion device | 台达电子工业股份有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-111433943-B | Composite comprising silicon carbide and carbon particles | 新强能电池公司 | 2023-08-25 | — | — | CN | disclosed |
| CN-116617712-A | Decoloring method for by-product high-boiling-point substances in monomer synthesis process | 唐山三友硅业有限责任公司 | 2023-08-22 | — | — | CN | disclosed |
| CN-219540055-U | Recovery processing device of organosilicon sediment thick liquid | 石河子大学 | 2023-08-18 | — | — | CN | disclosed |
| US-11728476-B2 | Surface modification of silicon particles for electrochemical storage | ENEVATE CORPORATION (US) | 2023-08-15 | — | — | US | disclosed |
| US-20230223512-A1 | SILICON PARTICLES FOR BATTERY ELECTRODES | ENEVATE CORPORATION | 2023-07-13 | — | — | US | disclosed |
| CN-219168250-U | Synthetic organosilicon sediment thick liquid processing apparatus | 新疆聚典新型建材有限公司 | 2023-06-13 | — | — | CN | disclosed |
| CN-116154198-A | Doped nano silicon carbide and application thereof in hydrogen fuel cell | 武汉楚能电子有限公司 | 2023-05-23 | — | — | CN | disclosed |
| CN-115970345-A | Method for treating organic silicon slurry slag | 江西蓝星星火有机硅有限公司 | 2023-04-18 | — | — | CN | disclosed |
| CN-115763844-A | Hydrogen fuel cell structure based on nano silicon carbide material | 武汉楚能电子有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-115746042-A | Method for catalytically cracking organic silicon high-boiling residues | 江西蓝星星火有机硅有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-113666376-B | Recycling treatment method for silicon slag | 武汉纺织大学 | 2023-03-03 | — | — | CN | disclosed |
| US-11548991-B2 | Modified silicon particles for silicon-carbon composite electrodes | ENEVATE CORPORATION (US) | 2023-01-10 | — | — | US | disclosed |
| US-11549055-B2 | Wavelength converting device | DELTA ELECTRONICS, INC. (TW) | 2023-01-10 | — | — | US | disclosed |
| US-11539041-B2 | Silicon particles for battery electrodes | ENEVATE CORPORATION (US) | 2022-12-27 | — | — | US | disclosed |
| CN-115346921-A | Semiconductor structure | 台湾积体电路制造股份有限公司 | 2022-11-15 | — | — | CN | disclosed |
| CN-217431488-U | Recovery processing device of organosilicon sediment thick liquid | 湖北华欣有机硅新材料有限公司 | 2022-09-16 | — | — | CN | disclosed |
| US-11380890-B2 | Surface modification of silicon particles for electrochemical storage | ENEVATE CORPORATION (US) | 2022-07-05 | — | — | US | disclosed |
| CN-110182808-B | Preparation method of silicon-carbon alkene and method for preparing hydrogen by photolysis of water vapor | 武汉楚能电子有限公司 | 2022-06-10 | — | — | CN | disclosed |
| CN-216655761-U | Green high-efficient recycle device of organosilicon discarded object | 云南省能源研究院有限公司 | 2022-06-03 | — | — | CN | disclosed |
| US-11329141-B2 | Spacer structure with high plasma resistance for semiconductor devices | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-05-10 | — | — | US | disclosed |
| CN-109585554-B | Semiconductor device and method of forming the same | 台湾积体电路制造股份有限公司 | 2022-04-19 | — | — | CN | disclosed |
| CN-113924667-A | Silicon dominated battery electrodes | 新强能电池公司 | 2022-01-11 | — | — | CN | disclosed |
| CN-215463906-U | Processing apparatus of organosilicon sediment thick liquid | 湖北华欣有机硅新材料有限公司 | 2022-01-11 | — | — | CN | disclosed |
| CN-113906588-A | Modified silicon particles for silicon-carbon composite electrodes | 新强能电池公司 | 2022-01-07 | — | — | CN | disclosed |
| CN-109179849-B | Organic silicon industrial sewage treatment method | 深圳瑞赛环保科技有限公司 | 2021-12-21 | — | — | CN | disclosed |
| CN-106178386-B | Treatment method and treatment device of organic silicon slag slurry | 合盛硅业股份有限公司 | 2021-12-14 | — | — | CN | disclosed |
| CN-113666376-A | Recycling treatment method for silicon slag | 武汉纺织大学 | 2021-11-19 | — | — | CN | disclosed |
| CN-111960421-B | Preparation method of coated carbon-silicon negative electrode material | 北京理工大学 | 2021-11-05 | — | — | CN | disclosed |
| CN-113478712-A | Organosilicon sediment thick liquid processing apparatus | 抚州市天和硅业有限责任公司 | 2021-10-08 | — | — | CN | disclosed |
| US-20210301198-A1 | WAVELENGTH CONVERTING DEVICE | DELTA ELECTRONICS, INC. (TW) | 2021-09-30 | — | — | US | disclosed |
| CN-113448157-A | Wavelength conversion device | 台达电子工业股份有限公司 | 2021-09-28 | — | — | CN | disclosed |
| CN-214160385-U | Organosilicon raw materials for production processing apparatus | 天长市荣盛有机硅科技有限公司 | 2021-09-10 | — | — | CN | disclosed |
| US-20210202735-A1 | Inner Spacers for Gate-All-Around Semiconductor Devices | TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD. (TW) | 2021-07-01 | — | — | US | disclosed |
| CN-109224608-B | High thing separation and recovery equipment that boils of organosilicon sediment thick liquid | 湖北硅元新材料科技有限公司 | 2021-06-11 | — | — | CN | disclosed |
| CN-109045738-B | Organosilicon waste liquid processing system | 湖北硅元新材料科技有限公司 | 2021-06-11 | — | — | CN | disclosed |
| US-11028242-B2 | Modified silicon particles for silicon-carbon composite electrodes | ENEVATE CORPORATION (US) | 2021-06-08 | — | — | US | disclosed |
| US-20210163699-A1 | MODIFIED SILICON PARTICLES FOR SILICON-CARBON COMPOSITE ELECTRODES | ENEVATE CORP (US) | 2021-06-03 | — | — | US | disclosed |
| CN-109095534-B | Organic silicon waste liquid treatment process | 山东硅科新材料有限公司 | 2021-06-01 | — | — | CN | disclosed |
| CN-112531030-A | Semiconductor device with a plurality of semiconductor chips | 台湾积体电路制造股份有限公司 | 2021-03-19 | — | — | CN | disclosed |
| US-20210083091-A1 | INNER SPACERS FOR GATE-ALL-AROUND SEMICONDUCTOR DEVICES | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-03-18 | — | — | US | disclosed |
| US-10950731-B1 | Inner spacers for gate-all-around semiconductor devices | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-03-16 | — | — | US | disclosed |
| US-20210066075-A1 | STRUCTURES INCLUDING DIELECTRIC LAYERS AND METHODS OF FORMING SAME | ASM IP HOLDING B.V. (NL) | 2021-03-04 | — | — | US | disclosed |
| CN-212440093-U | Slag slurry drying device and organic silicon slag slurry treatment system | 合盛硅业股份有限公司 | 2021-02-02 | — | — | CN | disclosed |
| US-20210028293-A1 | Spacer Structure with High Plasma Resistance for Semiconductor Devices | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2021-01-28 | — | — | US | disclosed |
| CN-109225053-B | Organosilicon sediment thick liquid processing apparatus | 广德县桃州镇明莲蔬果种植家庭农场 | 2021-01-05 | — | — | CN | disclosed |
| CN-109045555-B | Treatment process of organic silicon slag slurry | 安徽灿森新能源科技有限公司 | 2020-12-15 | — | — | CN | disclosed |
| CN-107552031-B | Preparation method and application of titanium-containing silicon oxide material | 东联化学股份有限公司 | 2020-12-11 | — | — | CN | disclosed |
| CN-109157852-B | Organosilicon sediment thick liquid processing apparatus | 淮北亚荣科技有限公司 | 2020-12-08 | — | — | CN | disclosed |
| US-20200377678-A1 | MODIFIED SILICON PARTICLES FOR SILICON-CARBON COMPOSITE ELECTRODES | ENEVATE CORPORATION | 2020-12-03 | — | — | US | disclosed |
| US-20200381711-A1 | SILICON-DOMINANT BATTERY ELECTRODES | ENEVATE CORPORATION | 2020-12-03 | — | — | US | disclosed |
| CN-111960421-A | Preparation method of coated carbon-silicon negative electrode material | 北京理工大学 | 2020-11-20 | — | — | CN | disclosed |
| CN-109224490-B | Organosilicon synthetic waste recycling device | 苏州市东挺河智能科技发展有限公司 | 2020-11-17 | — | — | CN | disclosed |
| CN-111841050-A | Slag slurry drying device and organic silicon slag slurry treatment system | 合盛硅业股份有限公司 | 2020-10-30 | — | — | CN | disclosed |
| US-10804374-B2 | Spacer structure with high plasma resistance for semiconductor devices | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-10-13 | — | — | US | disclosed |
| CN-109231220-B | Production process of fumed silica | 江西星火狮达科技有限公司 | 2020-10-02 | — | — | CN | disclosed |
| US-20200313167-A1 | SILICON PARTICLES FOR BATTERY ELECTRODES | ENEVATE CORPORATION | 2020-10-01 | — | — | US | disclosed |
| CN-108558928-B | Method and equipment for comprehensively recycling organic silicon slag slurry | 成都斯力康科技股份有限公司 | 2020-08-18 | — | — | CN | disclosed |
| CN-111433943-A | Composite comprising silicon carbide and carbon particles | 新强能电池公司 | 2020-07-17 | — | — | CN | disclosed |
| US-20200227738-A1 | SURFACE MODIFICATION OF SILICON PARTICLES FOR ELECTROCHEMICAL STORAGE | ENEVATE CORP (US) | 2020-07-16 | — | — | US | disclosed |
| US-10707478-B2 | Silicon particles for battery electrodes | ENEVATE CORPORATION (US) | 2020-07-07 | — | — | US | disclosed |
| CN-210934701-U | Processing apparatus of organosilicon sediment thick liquid | 云南省能源研究院有限公司 | 2020-07-07 | — | — | CN | disclosed |
| US-20200127112-A1 | SPACER STRUCTURE WITH HIGH PLASMA RESISTANCE FOR SEMICONDUCTOR DEVICES | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2020-04-23 | — | — | US | disclosed |
| CN-110783271-A | Method for forming semiconductor structure | 台湾积体电路制造股份有限公司 | 2020-02-11 | — | — | CN | disclosed |
| CN-209772083-U | Organosilicon auxiliary agent waste material environmental protection processing apparatus | 靖江科瑞新材料有限公司 | 2019-12-13 | — | — | CN | disclosed |
| US-10483372-B2 | Spacer structure with high plasma resistance for semiconductor devices | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2019-11-19 | — | — | US | disclosed |
| CN-110339622-A | A kind of organosilicon slag slurry hydrolysis process method | 江苏明珠硅橡胶材料有限公司 | 2019-10-18 | — | — | CN | disclosed |
| CN-110330521-A | A kind of organosilicon slag slurry processing method | 江苏明珠硅橡胶材料有限公司 | 2019-10-15 | — | — | CN | disclosed |
| CN-104733421-B | Method for laser welding, fixture for laser welding, semiconductor device | 富士电机株式会社 | 2019-10-11 | — | — | CN | disclosed |
| EP-2868646-B1 | METHOD FOR PRODUCING ALDEHYDE | KAO CORP (JP) | 2019-07-24 | — | — | EP | disclosed |
| US-20190181426-A1 | SILICON PARTICLES FOR BATTERY ELECTRODES | ENEVATE CORPORATION | 2019-06-13 | — | — | US | disclosed |
| CN-109755169-A | Chip carries fork, system for manufacturing semiconductor device and chip transportation method | 台湾积体电路制造股份有限公司 | 2019-05-14 | — | — | CN | disclosed |
| CN-106478105-B | A kind of method that multistep reaction sintering process prepares the thyrite of low residual silicon | 西安交通大学 | 2019-04-09 | — | — | CN | disclosed |
| US-20190103475-A1 | SPACER STRUCTURE WITH HIGH PLASMA RESISTANCE FOR SEMICONDUCTOR DEVICES | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2019-04-04 | — | — | US | disclosed |
| CN-109260815-A | A kind of organosilicon slag slurry processing method | 褚成亮 | 2019-01-25 | — | — | CN | disclosed |
| CN-109224483-A | A kind of synthesizing organo-silicon slurry processing system | 兰凤 | 2019-01-18 | — | — | CN | disclosed |
| CN-109224490-A | A kind of organosilicon synthesis recovery and reuse of waste device | 兰凤 | 2019-01-18 | — | — | CN | disclosed |
| CN-109224608-A | A kind of organosilicon slag slurry high-boiling components separation and recovery equipment | 兰凤 | 2019-01-18 | — | — | CN | disclosed |
| CN-109179849-A | A kind of silicone industry sewage water treatment method | 兰凤 | 2019-01-11 | — | — | CN | disclosed |
| CN-109157852-A | A kind of organosilicon slag slurry processing unit | 褚成亮 | 2019-01-08 | — | — | CN | disclosed |
| CN-109148566-A | Silicon carbide MOSFET device and its manufacturing method | 电子科技大学 | 2019-01-04 | — | — | CN | disclosed |
| CN-105938794-B | Method, composite wafer and the semiconductor devices of manufacturing semiconductor devices | 英飞凌科技奥地利有限公司 | 2018-12-28 | — | — | CN | disclosed |
| CN-109045555-A | A kind for the treatment of process of organosilicon slag slurry | 兰凤 | 2018-12-21 | — | — | CN | disclosed |
| CN-109045738-A | A kind of organic silicon waste liquid processing system | 兰凤 | 2018-12-21 | — | — | CN | disclosed |
| CN-108807527-A | Group IIIA nitride HEMT with tunnel diode in gate stack | 德克萨斯仪器股份有限公司 | 2018-11-13 | — | — | CN | disclosed |
| CN-108779908-A | Compound parabolic collimator array for high intensity illumination | 飞利浦照明控股有限公司 | 2018-11-09 | — | — | CN | disclosed |
| CN-106834765-B | A method of preparing silicon-containing alloy with the silicon carbide cutting waste material of crystalline silicon | 东北大学 | 2018-10-23 | — | — | CN | disclosed |
| CN-106834765-B | A method of preparing silicon-containing alloy with the silicon carbide cutting waste material of crystalline silicon | 东北大学 | 2018-10-23 | — | — | CN | disclosed |
| US-20180226642-A1 | SURFACE MODIFICATION OF SILICON PARTICLES FOR ELECTROCHEMICAL STORAGE | ENEVATE CORPORATION | 2018-08-09 | — | — | US | disclosed |
| CN-107686369-A | A kind of method for preparing carborundum porous ceramics with the carborundum cutting waste material of crystalline silicon | 东北大学 | 2018-02-13 | — | — | CN | disclosed |
| CN-107686369-A | A kind of method for preparing carborundum porous ceramics with the carborundum cutting waste material of crystalline silicon | 东北大学 | 2018-02-13 | — | — | CN | disclosed |
| CN-107109711-A | Apparatus and method for producing carborundum | 帕德博恩大学 | 2017-08-29 | — | — | CN | disclosed |
| CN-104962716-B | Gas catalysis nonflame near-infrared heating anneal stove | 周海波 | 2017-08-25 | — | — | CN | disclosed |
| CN-106922178-A | Light emitting device | 飞利浦照明控股有限公司 | 2017-07-04 | — | — | CN | disclosed |
| CN-106834765-A | A kind of method for preparing silicon-containing alloy with the carborundum cutting waste material of crystalline silicon | 东北大学 | 2017-06-13 | — | — | CN | disclosed |
| CN-106834765-A | A kind of method for preparing silicon-containing alloy with the carborundum cutting waste material of crystalline silicon | 东北大学 | 2017-06-13 | — | — | CN | disclosed |
| CN-106558686-A | Preparation method of carbon-coated silicon/silicon carbide composite active material | 萧镇能 | 2017-04-05 | — | — | CN | disclosed |
| CN-106478105-A | A kind of method that multistep reaction sintering process prepares the thyrite of low residual silicon | 西安交通大学 | 2017-03-08 | — | — | CN | disclosed |
| CN-106461182-A | Luminescence concentrator with increased efficiency | 飞利浦照明控股有限公司 | 2017-02-22 | — | — | CN | disclosed |
| US-20170040598-A1 | SURFACE MODIFICATION OF SILICON PARTICLES FOR ELECTROCHEMICAL STORAGE | ENEVATE CORPORATION | 2017-02-09 | — | — | US | disclosed |
| EP-2420506-B1 | PROCESS FOR PRODUCTION OF CYCLIC SILANE COMPOUND AND/OR CYCLIC CARBOSILANE COMPOUND | NIPPON SODA CO (JP) | 2016-11-16 | — | — | EP | disclosed |
| CN-103619766-B | Production of silica soot bodies | 贺利氏石英英国有限公司 | 2016-08-17 | — | — | CN | disclosed |
| CN-103050406-B | For the method manufacturing semiconductor transistor construction | 英飞凌科技奥地利有限公司 | 2016-08-10 | — | — | CN | disclosed |
| US-9348228-B2 | Acid-strippable silicon-containing antireflective coating | GLOBALFOUNDRIES INC. (KY) | 2016-05-24 | — | — | US | disclosed |
| CN-204962762-U | Gas catalysis nonflame near -infrared direct heating porous medium combustor | ZHOU HAIBO | 2016-01-13 | — | — | CN | disclosed |
| CN-204962761-U | Gas catalysis nonflame near -infrared indirect heating porous medium combustor | ZHOU HAIBO | 2016-01-13 | — | — | CN | disclosed |
| CN-204874638-U | Nearly infrared heating of gas catalysis nonflame stove of annealing | ZHOU HAIBO | 2015-12-16 | — | — | CN | disclosed |
| CN-104964281-A | Fuel-gas-catalyzed flameless near-infrared indirect heating porous medium burner | ZHOU HAIBO | 2015-10-07 | — | — | CN | disclosed |
| CN-104962716-A | Gas catalytic flameless near-infrared heating annealing furnace | ZHOU HAIBO | 2015-10-07 | — | — | CN | disclosed |
| CN-104930513-A | Fuel-gas-catalyzing flameless near-infrared direct heating porous medium combustor | ZHOU HAIBO | 2015-09-23 | — | — | CN | disclosed |
| CN-104733421-A | LASER WELDING METHOD, LASER WELDING JIG, AND SEMICONDUCTOR DEVICE | FUJI ELECTRIC CO LTD | 2015-06-24 | — | — | CN | disclosed |
| US-9029585-B2 | Process for production of cyclic silane compound and/or cyclic carbosilane compound | NIPPON SODA CO., LTD. (JP) | 2015-05-12 | — | — | US | disclosed |
| CN-104045059-A | Organosilicon slurry slag hydrolysis treatment process, byproduct and application thereof | LUZHOU NORTH CHEMICAL IND CO | 2014-09-17 | — | — | CN | disclosed |
| CN-103996663-A | Semiconductor modules and methods of formation thereof | INFINEON TECHNOLOGIES AG | 2014-08-20 | — | — | CN | disclosed |
| CN-102470310-B | Exhaust gas purification device and exhaust gas purification method | IBIDEN CO LTD | 2014-07-23 | — | — | CN | disclosed |
| US-20140186774-A1 | ACID-STRIPPABLE SILICON-CONTAINING ANTIREFLECTIVE COATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-07-03 | — | — | US | disclosed |
| US-20140128628-A1 | PROCESS FOR PRODUCTION OF CYCLIC SILANE COMPOUND AND/OR CYCLIC CARBOSILANE COMPOUND | NIPPON SODA CO., LTD. (JP) | 2014-05-08 | — | — | US | disclosed |
| US-8669390-B2 | Process for production of cyclic silane compound and/or cyclic carbosilane compound | NIPPON SODA CO., LTD. (JP) | 2014-03-11 | — | — | US | disclosed |
| CN-103619766-A | Production of silica soot bodies | HERAEUS QUARTZ UK LTD | 2014-03-05 | — | — | CN | disclosed |
| US-20140023929-A1 | Silicon-Containing Carbonaceous Composite Material | DOW CORNING TORAY CO., LTD. (JP) | 2014-01-23 | — | — | US | disclosed |
| WO-2013115114-A1 | SILICON-CONTAINING CARBON-BASED COMPOSITE MATERIAL | DOW CORNING TORAY CO., LTD. (JP) | 2013-08-08 | — | — | WO | disclosed |
| CN-101807547-B | Photosensitive composite dielectric gate MOSFET (Metal-Oxide-Semiconductor Field Effect Transistor) detector | NANJING UNIVERSITY OF TECHNOLOGY | 2013-07-10 | — | — | CN | disclosed |
| US-8481423-B2 | Methods to mitigate plasma damage in organosilicate dielectrics | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-09 | — | — | US | disclosed |
| US-8470706-B2 | Methods to mitigate plasma damage in organosilicate dielectrics | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-06-25 | — | — | US | disclosed |
| CN-103050406-A | Method for manufacturing semi-conductor transistor structure | INFINEON TECHNOLOGIES AUSTRIA | 2013-04-17 | — | — | CN | disclosed |
| CN-101850203-B | Sealing material for honeycomb structured body, honeycomb structured body and method for manufacturing honeycomb structured body | IBIDEN CO LTD | 2013-04-17 | — | — | CN | disclosed |
| US-8410352-B2 | Method of fabricating photovoltaic cells | SOLARFORCE (FR) | 2013-04-02 | — | — | US | disclosed |
| US-8349217-B2 | Method for producing positive electrode material for secondary battery | TOKYO INSTITUTE OF TECHNOLOGY (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20120329269-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-27 | — | — | US | disclosed |
| CN-101921127-B | Manufacturing method of long-life high-temperature resistant radiation pipe | WUHAN IRON & STEEL GROUP CORP | 2012-11-21 | — | — | CN | disclosed |
| CN-102779857-A | Edge termination structures for silicon carbide devices and methods of fabricating silicon carbide devices incorporating same | CREE INC | 2012-11-14 | — | — | CN | disclosed |
| WO-2012105669-A1 | METHOD FOR MANUFACTURING A CARBON SURFACE-COATED SILICON-CONTAINING CARBON-BASED COMPOSITE MATERIAL | DOW CORNING TORAY CO., LTD. (JP) | 2012-08-09 | — | — | WO | disclosed |
| CN-101471387-B | P-type doped layer of photoelectric conversion element and manufacturing method thereof | IND TECH RES INST | 2012-07-11 | — | — | CN | disclosed |
| CN-102470310-A | Exhaust gas purification device and exhaust gas purification method | IBIDEN CO LTD | 2012-05-23 | — | — | CN | disclosed |
| CN-101421016-B | Honeycomb structure and method for manufacturing honeycomb structure | IBIDEN CO LTD | 2012-04-25 | — | — | CN | disclosed |
| US-8129843-B2 | Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | disclosed |
| EP-2420506-A1 | PROCESS FOR PRODUCTION OF CYCLIC SILANE COMPOUND AND/OR CYCLIC CARBOSILANE COMPOUND | Nippon Soda Co., Ltd. (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-20120016149-A1 | PROCESS FOR PRODUCTION OF CYCLIC SILANE COMPOUND AND/OR CYCLIC CARBOSILANE COMPOUND | NIPPON SODA CO., LTD. (JP) | 2012-01-19 | — | — | US | disclosed |
| CN-101374590-B | Honeycomb structure | IBIDEN CO.,LTD. (JP) | 2011-12-21 | — | — | CN | disclosed |
| CN-102190679-A | Novel silazane-tetra(acetylenylaniline)-silane and preparation method thereof | UNIV EAST CHINA SCIENCE & TECH | 2011-09-21 | — | — | CN | disclosed |
| CN-101386626-B | Organosilicon slag slurry treatment method and apparatus thereof | JIANGSU HONGDA NEW MATERIAL CO LTD | 2011-06-22 | — | — | CN | disclosed |
| CN-101518744-B | Sealing material for a honeycomb structured body, honeycomb structured body and method for manufacturing the honeycomb structured body | IBIDEN CO LTD | 2011-04-06 | — | — | CN | disclosed |
| US-20110042789-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM | JSR CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20100320617-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS USING A PROTECTIVE SIDEWALL SPACER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-23 | — | — | US | disclosed |
| EP-2264219-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND PROCESS FOR PRODUCTION THEREOF | JSR Corporation (JP) | 2010-12-22 | — | — | EP | disclosed |
| CN-101921127-A | Manufacturing method of long-life high-temperature resistant radiation pipe | WUHAN IRON & STEEL GROUP CORP | 2010-12-22 | — | — | CN | disclosed |
| CN-101850203-A | Honeycomb body and function encapsulant, honeycomb structured body and manufacture method thereof | IBIDEN CO LTD | 2010-10-06 | — | — | CN | disclosed |
| US-7781332-B2 | Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-24 | — | — | US | disclosed |
| CN-101807547-A | Photosensitive composite dielectric gate MOSFET (Metal-Oxide-Semiconductor Field Effect Transistor) detector | NANJING UNIVERSITY OF TECHNOLOGY | 2010-08-18 | — | — | CN | disclosed |
| US-20100174103-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-08 | — | — | US | disclosed |
| CN-101731293-A | Energy-saving and environment-friendly electric heating pancake making machine | ZILING YAN | 2010-06-16 | — | — | CN | disclosed |
| US-20100140540-A1 | Method For Producing Positive Electrode Material For Secondary Battery | DOW CORNING TORAY CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100140754-A1 | FILM-FORMING MATERIAL, SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-06-10 | — | — | US | disclosed |
| EP-2166600-A1 | METHOD FOR PRODUCING POSITIVE ELECTRODE MATERIAL FOR SECONDARY BATTERY | Tokyo Institute of Technology (JP) | 2010-03-24 | — | — | EP | disclosed |
| EP-2123658-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR Corporation (JP) | 2009-11-25 | — | — | EP | disclosed |
| CN-101518744-A | Sealing material for a honeycomb structured body, honeycomb structured body and method for manufacturing the honeycomb structured body | IBIDEN CO LTD | 2009-09-02 | — | — | CN | disclosed |
| CN-100517500-C | Magnetic random access memory devices including heat generating layers and related methods | SAMSUNG ELECTRONICS CO LTD (KR) | 2009-07-22 | — | — | CN | disclosed |
| CN-101471387-A | P-type doped layer of photoelectric conversion element and manufacturing method thereof | IND TECH RES INST (CN) | 2009-07-01 | — | — | CN | disclosed |
| EP-2053107-A1 | FILM-FORMING MATERIAL, SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR Corporation (JP) | 2009-04-29 | — | — | EP | disclosed |
| CN-101421016-A | Honeycomb structure and process for producing the same | IBIDEN CO LTD (JP) | 2009-04-29 | — | — | CN | disclosed |
| US-20090075472-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-19 | — | — | US | disclosed |
| US-20090072401-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS USING A PROTECTIVE SIDEWALL SPACER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-19 | — | — | US | disclosed |
| CN-101386626-A | Organosilicon slag slurry treatment method and apparatus thereof | JIANGSU HONGDA NEW MATERIAL CO (CN) | 2009-03-18 | — | — | CN | disclosed |
| CN-101374590-A | Honeycomb structure | IBIDEN CO LTD (JP) | 2009-02-25 | — | — | CN | disclosed |
| CN-101371362-A | Edge termination structure for silicon carbide devices and method of making silicon carbide devices incorporating the same | CREE INC (US) | 2009-02-18 | — | — | CN | disclosed |
| CN-101318826-A | Jig for firing and method for manufacturing honeycomb structure | IBIDEN CO LTD (JP) | 2008-12-10 | — | — | CN | disclosed |
| CN-101312895-A | Manufacturing method of conveyer and cellular construction | IBIDEN CO LTD (JP) | 2008-11-26 | — | — | CN | disclosed |
| CN-101312810-A | Powder mixing method, agitator and manufacturing method of cellular construction body | IBIDEN CO LTD (JP) | 2008-11-26 | — | — | CN | disclosed |
| US-20080210299-A1 | Method of Fabricating Photocoltaic Cells | SOLARFORCE (FR) | 2008-09-04 | — | — | US | disclosed |
| CN-100390927-C | wafer support with improved processing characteristics | SAINT GOBAIN CERAMICS (US) | 2008-05-28 | — | — | CN | disclosed |
| CN-1915999-A | Method for preparing dimethyldichlorosilane by cracking | CHINA PETROCHEMICAL CORP (CN) | 2007-02-21 | — | — | CN | disclosed |
| EP-1262233-B1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | SUMITOMO CHEMICAL CO (JP) | 2006-07-19 | — | — | EP | disclosed |
| EP-1262233-B1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | SUMITOMO CHEMICAL CO (JP) | 2006-07-19 | — | — | EP | disclosed |
| CN-1765005-A | Wafer carrier having improved processing characteristics | SAINT GOBAIN CERAMICS (US) | 2006-04-26 | — | — | CN | disclosed |
| CN-1655278-A | Magnetic random access memory devices including heat generating layers and related methods | SAMSUNG ELECTRONICS CO LTD (KR) | 2005-08-17 | — | — | CN | disclosed |
| US-6881697-B1 | Process for producing titanium-containing silicon oxide catalyst, the catalyst, and process for producing oxirane compound with the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-04-19 | — | — | US | disclosed |
| US-6881697-B1 | Process for producing titanium-containing silicon oxide catalyst, the catalyst, and process for producing oxirane compound with the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-04-19 | — | — | US | disclosed |
| CN-1590389-A | Method for preparing dimethyldichlorosilane by using organic silicon high-boiling residues | CHINA NAT PETROLEUM CORP (CN) | 2005-03-09 | — | — | CN | disclosed |
| CN-1138767-C | Process for producing titanium-contg. silicon oxide catalyst, catalyst, and process for producing oxirane compound with said catalyst | ס�ѻ�ѧ��ҵ��ʽ���� | 2004-02-18 | — | — | CN | disclosed |
| EP-1262233-A4 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | SUMITOMO CHEMICAL CO (JP) | 2004-02-04 | — | — | EP | disclosed |
| CN-1387462-A | Process for producing titanium-contg. silicon oxide catalyst, catalyst, and process for producing oxirane compound with said catalyst | SUMITOMO CHEMICAL CO (JP) | 2002-12-25 | — | — | CN | disclosed |
| EP-1262233-A1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | Sumitomo Chemical Company, Limited (JP) | 2002-12-04 | — | — | EP | disclosed |
| EP-1262233-A1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | Sumitomo Chemical Company, Limited (JP) | 2002-12-04 | — | — | EP | disclosed |
| WO-2001034299-A1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-05-17 | — | — | WO | disclosed |
| JP-2001129411-A | MANUFACTURING METHOD OF TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST AND METHOD FOR MANUFACTURING OXIRANE COMPOUND USING THE CATALYST | SUMITOMO CHEM CO LTD | 2001-05-15 | — | — | JP | disclosed |
| WO-2001031401-A1 | SELF-PROCESSING OF DIFFRACTIVE OPTICAL COMPONENTS IN HYBRID SOL-GEL GLASSES | MCGILL UNIVERSITY (CA) | 2001-05-03 | — | — | WO | disclosed |
| US-5455208-A | Heat resistance; ceramic composites | ALLIEDSIGNAL INC. (US) | 1995-10-03 | — | — | US | disclosed |
| EP-0618937-A1 | CARBON-CONTAINING BLACK GLASS MONOLITHS | AlliedSignal Inc. (US) | 1994-10-12 | — | — | EP | disclosed |
| US-5340777-A | Precursor polymers derived from reaction of cyclosiloxanes and linear siloxanes containing hydrogen and vinyl groups | ALLIEDSIGNAL INC. (US) | 1994-08-23 | — | — | US | disclosed |
| US-5328976-A | Chemical intermediates for silicon carbon oxides | ALLIED-SIGNAL INC. (US) | 1994-07-12 | — | — | US | disclosed |
| WO-1993013159-A1 | CARBON-CONTAINING BLACK GLASS MONOLITHS | ALLIED-SIGNAL INC. (US) | 1993-07-08 | — | — | WO | disclosed |
| JP-H03295881-A | SILICON CARBIDE MEMBER AND ITS PRODUCTION | TOSHIBA CERAMICS CO LTD | 1991-12-26 | — | — | JP | disclosed |
| JP-H03295881-A | SILICON CARBIDE MEMBER AND ITS PRODUCTION | TOSHIBA CERAMICS CO LTD | 1991-12-26 | — | — | JP | disclosed |