SCHEMBL4925814

SCHEMBL4925814

CC(N)(O)CCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL322174 0.81
SCHEMBL8577025 0.79
SCHEMBL4271852 0.79 SMN1; SMN2 (0.40)
SCHEMBL1409321 0.79
SCHEMBL15562575 0.78 MEN1 (0.41)
SCHEMBL3421034 0.77
SCHEMBL27886724 0.77 SMN1; SMN2 (0.38)
Hydrochloric Acid SCHEMBL20573039 0.77
SCHEMBL14973537 0.77
SCHEMBL758426 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105517977-A Compositions with improved urease-inhibiting effect comprising (thio)phosphoric acid triamide and further compounds BASF SE 2016-04-20 CN claimed
CN-116917130-A Cementing compositions 巴斯夫欧洲公司 2023-10-20 CN disclosed
CN-112424306-B Adhesive composition for semiconductor circuit connection and adhesive film comprising the same 株式会社LG化学 2022-11-01 CN disclosed
CN-115152007-A Solder bump forming member, method for manufacturing solder bump forming member, and method for manufacturing solder bump-attached electrode substrate 昭和电工材料株式会社 2022-10-04 CN disclosed
CN-115003276-A Composition for preventing fading of hair dye or kit for hair dye 株式会社资生堂 2022-09-02 CN disclosed
CN-110317573-B Polishing composition, method for producing same, and magnetic polishing method 福吉米株式会社 2022-07-15 CN disclosed
CN-111201294-B Optical adhesive and optical laminate and lens formed therefrom 视觉缓解公司 2022-07-01 CN disclosed
CN-108026120-B Process for recovering a mixture containing a (thio) phosphoric acid derivative 巴斯夫欧洲公司 2021-11-16 CN disclosed
CN-113490652-A Mixtures comprising glyoxylic acid or condensation or addition products thereof 巴斯夫欧洲公司 2021-10-08 CN disclosed
CN-109195932-B Use of a cation source to prevent decomposition of (thio) phosphoric acid triamide urease inhibitors in the presence of phosphorus-containing fertilizers 巴斯夫欧洲公司 2021-09-21 CN disclosed
CN-105517977-A Compositions with improved urease-inhibiting effect comprising (thio)phosphoric acid triamide and further compounds BASF SE 2016-04-20 CN disclosed
CN-105085282-A Preparation method for alkyl alcohol amine NANJING BAOCHUN CHEMICAL INDUSTRY CO LTD 2015-11-25 CN disclosed
CN-103249559-B Encapsulating semiconductor fills the manufacture method and semiconductor device of using film resin composition, semiconductor device HITACHI CHEMICAL CO.,LTD. (JP) 2015-08-05 CN disclosed
EP-2668177-B1 SUBSTITUTED PYRIDINYL-PYRIMIDINES AND THEIR USE AS MEDICAMENTS BOEHRINGER INGELHEIM INT (DE) 2014-10-22 EP disclosed
US-8772305-B2 Substituted pyridinyl-pyrimidines and their use as medicaments BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2014-07-08 US disclosed
EP-2668177-A1 SUBSTITUTED PYRIDINYL-PYRIMIDINES AND THEIR USE AS MEDICAMENTS Boehringer Ingelheim International GmbH (DE) 2013-12-04 EP disclosed
US-20130023502-A1 SUBSTITUTED PYRIDINYL-PYRIMIDINES AND THEIR USE AS MEDICAMENTS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2013-01-24 US disclosed
WO-2012101013-A1 SUBSTITUTED PYRIDINYL-PYRIMIDINES AND THEIR USE AS MEDICAMENTS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2012-08-02 WO disclosed
US-20080167394-A1 Process for the preparation of PIPA polyols for the production of highly elastic flexible polyurethane foams BAYER MATERIALSCIENCE AG 2008-07-10 US disclosed
US-6495243-B1 Recording substrates for ink jet printing XEROX CORPORATION 2002-12-17 US disclosed