⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butadiene SCHEMBL692753 | 0.78 | — | — | |
| Nitrous Acid SCHEMBL21951465 | 0.76 | — | — | |
| Nitrous Acid SCHEMBL28246268 | 0.75 | — | — | |
| Propene SCHEMBL27593070 | 0.75 | — | — | |
| Nitrous Acid SCHEMBL28854632 | 0.75 | — | — | |
| Butadiene SCHEMBL15551549 | 0.75 | — | — | |
| Nitrous Acid SCHEMBL28765632 | 0.75 | — | — | |
| Nitrous Acid SCHEMBL8612516 | 0.71 | — | — | |
| Vinyl Chloride SCHEMBL11778355 | 0.71 | — | — | |
| Vinyl Chloride SCHEMBL15057 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-210940807-U | Double-layer flame-retardant anti-electric arc fabric | 百佳(福建)内衣有限公司 | 2020-07-07 | — | — | CN | claimed |
| CN-111809285-A | Ultraviolet-resistant aramid yarn and preparation method thereof | 西安工程大学 | 2020-10-23 | — | — | CN | disclosed |
| US-8381647-B2 | Anti-marking coverings for printing presses | PRINTGUARD, INC. (US) | 2013-02-26 | — | — | US | disclosed |
| US-20080026201-A1 | ANTI-MARKING COVERINGS FOR PRINTING PRESSES | PRINTGUARD, INC. (US) | 2008-01-31 | — | — | US | disclosed |
| US-20070261579-A1 | FIXTURE FOR ANTI-MARKING COVERINGS FOR PRINTING PRESSES | PRINTGUARD, INC. (US) | 2007-11-15 | — | — | US | disclosed |