SCHEMBL4953296

SCHEMBL4953296

C=C(C)C(=O)OCOc1ccc(C2(c3ccc(OCOC(=O)C(=C)C)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.40
APEX1 P27695 1/20 0.40
HTT P42858 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
MEN1 O00255 2/20 0.39
MAPT P10636 2/20 0.39
KMT2A Q03164 2/20 0.39
KDM4E B2RXH2 1/20 0.39
LMNA P02545 1/20 0.39
OPRK1 P41145 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
ELANE P08246 1/20 0.36
PDK2 Q15119 10/20 0.34
GPR174 Q9BXC1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13962696 0.93 POLB (0.36) POLBAPEX1HTTTDP1MEN1
SCHEMBL18325966 0.89 PDK2 (0.34) POLBAPEX1HTTTDP1MEN1
SCHEMBL157502 0.89 POLB (0.48) POLBAPEX1HTTTDP1MEN1
SCHEMBL30800968 0.89 POLB (0.48) POLBAPEX1HTTTDP1MEN1
SCHEMBL16425280 0.88 AR (0.36) POLBAPEX1HTTTDP1MEN1
SCHEMBL534807 0.88 POLB (0.53) POLBAPEX1HTTTDP1MEN1
SCHEMBL18325962 0.86 PDK2 (0.33) POLBAPEX1HTTTDP1PDK2
SCHEMBL14889149 0.85 POLB (0.45) POLBAPEX1HTTTDP1MEN1
SCHEMBL13878666 0.84 POLB (0.44) POLBAPEX1HTTTDP1MEN1
SCHEMBL4952710 0.84 POLB (0.43) POLBAPEX1HTTTDP1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11867694-B2 Latex particles for measurement reagents, sensitized latex particles, and measurement reagent for turbidimetric immunoassay SEKISUI MEDICAL CO., LTD. (JP) 2024-01-09 US disclosed
EP-3633374-A1 LATEX PARTICLES FOR MEASUREMENT REAGENTS, SENSITIZED LATEX PARTICLES, AND MEASUREMENT REAGENT FOR TURBIDIMETRIC IMMUNOASSAY Sekisui Chemical Co., Ltd. (JP) 2020-04-08 EP disclosed
US-10611869-B2 Curable composition and cured product AGC Inc. (JP) 2020-04-07 US disclosed
US-20200080996-A1 LATEX PARTICLES FOR MEASUREMENT REAGENTS, SENSITIZED LATEX PARTICLES, AND MEASUREMENT REAGENT FOR TURBIDIMETRIC IMMUNOASSAY SEKISUI CHEMICAL CO., LTD. (JP) 2020-03-12 US disclosed
US-20190218325-A1 CURABLE COMPOSITION AND CURED PRODUCT AGC Inc. (JP) 2019-07-18 US disclosed
US-7361432-B2 Composition for hologram-recording material, hologram-recording medium, and process for producing the same NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-04-22 US disclosed
US-20050185232-A1 Volume hologram recording photosensitive composition and its use NIPPON PAINT CO., LTD. (JP) 2005-08-25 US disclosed
US-20040096776-A1 Composition for hologram-recording material, hologram-recording medium, and process for producing the same Daiso, Co., Ltd. (JP) 2004-05-20 US disclosed
EP-1376268-A1 COMPOSITION FOR HOLOGRAM-RECORDING MATERIAL, HOLOGRAM-RECORDING MEDIUM, AND PROCESS FOR PRODUCING THE SAME National Institute of Advanced Industrial Science and Technology (JP) 2004-01-02 EP disclosed
US-20030096172-A1 Hologram recording material composition and hologram recording medium DAISO CO., LTD. (JP) 2003-05-22 US disclosed
EP-0980025-A1 Hologram recording material composition, hologram recording medium, and process for producing the same. AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-02-16 EP disclosed