SCHEMBL4961289

SCHEMBL4961289

NCC1CC2CCC1C(CN)C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ GABRR1 P24046 4/20 0.32
▸ GABRR2 P28476 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18542660 0.84 — —
SCHEMBL14300615 0.77 GABRR1 (0.35) GABRR1GABRR2
SCHEMBL203674 0.77 GABRR1 (0.35) GABRR1GABRR2
SCHEMBL20860322 0.76 — —
SCHEMBL20860351 0.76 — —
SCHEMBL23839182 0.76 — —
SCHEMBL31887 0.76 — —
SCHEMBL22958273 0.76 — —
SCHEMBL24521730 0.76 — —
SCHEMBL8247109 0.76 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1321487-B1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE MITSUI CHEMICALS INC (JP) 2008-02-27 — — EP disclosed
US-6710160-B2 VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS MITSUI CHEMICALS, INC. (JP) 2004-03-23 — — US disclosed
EP-1321487-A1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE Mitsui Chemicals, Inc. (JP) 2003-06-25 — — EP disclosed
US-20020188090-A1 Polyamic acid, polyimide, process for producing these, and film of the polyimide MITSUI CHEMICALS, INC. (JP) 2002-12-12 — — US disclosed
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