SCHEMBL497533

SCHEMBL497533

OC1C=CC=CC1(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6712998 0.75
SCHEMBL5198090 0.72
SCHEMBL28719615 0.72
SCHEMBL5857957 0.72
SCHEMBL31454144 0.72
SCHEMBL18224312 0.72
SCHEMBL7798878 0.72
SCHEMBL28159224 0.71
SCHEMBL28719613 0.70
Hydrochloric Acid SCHEMBL28317855 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 223 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119390368-A Steel slag-based iron aluminate cement and preparation method thereof 建筑材料工业技术监督研究中心 2025-02-07 CN claimed
CN-118717544-A Amino acid ultraviolet protection composition, preparation method and application 江南大学 2024-10-01 CN claimed
CN-115051006-A Neutral water system all-quinone organic flow battery couple and preparation method and application thereof 辽宁大学 2022-09-13 CN claimed
CN-114326333-A Polyvinyl alcohol cinnamate type KPR photoresist etching residue stripping agent composition 深圳迪道微电子科技有限公司 2022-04-12 CN claimed
CN-108570254-B Preparation method of liquid metal non-stick layer and appliance without sticking liquid metal 北京梦之墨科技有限公司 2020-07-07 CN claimed
CN-102298277-B Cleaning solution for thick-film photoresist ANJI MICROELECTRONICS CO LTD 2015-06-17 CN claimed
US-20130302504-A1 DIHYDROCHALCONE PURIFICATION PROCESS DSM IP ASSETS B.V. (NL) 2013-11-14 US claimed
CN-102851109-A Cooling liquid for diamond wire cutting solar silicon wafer MONTE GROUP HONG KONG LTD 2013-01-02 CN claimed
CN-101412948-B Cleaning agent for plasma etching residue ANJI MICROELECTRONICS CO LTD 2012-05-16 CN claimed
CN-101523298-B Photoresist cleaning agent ANJI MICROELECTRONICS CO LTD 2012-04-04 CN claimed
CN-101187787-A Low etching photoresist cleaning agent and its cleaning method ANJI MICROELECTRONICS CO LTD (CN) 2008-05-28 CN claimed
CN-101187788-A Low etching relative thick photoresist cleaning liquor ANJI MICROELECTRONICS CO LTD (CN) 2008-05-28 CN claimed
CN-101169597-A Photoresist detergent ANJI MICROELECTRONICS CO LTD (CN) 2008-04-30 CN claimed
CN-101169598-A Photoresist detergent ANJI MICROELECTRONICS CO LTD (CN) 2008-04-30 CN claimed
CN-101162369-A Low etching photoresist cleaning agent and cleaning method thereof ANJI MICROELECTRONICS CO LTD (CN) 2008-04-16 CN claimed
WO-2006039090-A2 SOLUTIONS FOR CLEANING SILICON SEMICONDUCTORS OR SILICON OXIDES LAM RESEARCH CORPORATION (US) 2006-04-13 WO claimed
US-20060073997-A1 Solutions for cleaning silicon semiconductors or silicon oxides LAM RESEARCH CORPORATION (US) 2006-04-06 US claimed
EP-0532554-A1 TEMPERATURE CHANGE INDICATOR EMPLOYING ENZYMES RAYBOURNE LIMITED (GB) 1993-03-24 EP claimed
WO-1991018109-A1 TEMPERATURE CHANGE INDICATOR EMPLOYING ENZYMES RAYBOURNE LIMITED (GB) 1991-11-28 WO claimed
US-4029618-A Vinyl halide stabilizer compositions of antimony organic sulfur-containing compounds and ortho-dihydric phenols DART INDUSTRIES INC. (US) 1977-06-14 US claimed