Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Cyclopentane SCHEMBL9930955 | 1.00 | TSHR (0.62) | TSHRALDH1A1 | |
| Cyclopentane SCHEMBL27972 | 1.00 | — | — | |
| Cyclohexane SCHEMBL14321050 | 1.00 | TSHR (0.62) | TSHRALDH1A1 | |
| Cyclohexane SCHEMBL23722952 | 1.00 | TSHR (0.62) | TSHRALDH1A1 | |
| Ethylene Glycol SCHEMBL20837 | 1.00 | — | — | |
| Cyclopentane SCHEMBL23631702 | 1.00 | TSHR (0.62) | TSHRALDH1A1 | |
| Ethylene Glycol SCHEMBL1434577 | 1.00 | TSHR (0.62) | TSHRALDH1A1 | |
| Cyclohexane SCHEMBL34608 | 1.00 | TSHR (0.62) | TSHRALDH1A1 | |
| Ethylene Glycol SCHEMBL7586284 | 1.00 | TSHR (0.62) | TSHRALDH1A1 | |
| Cyclopentane SCHEMBL8846814 | 1.00 | TSHR (0.62) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0544032-B1 | Polyester block copolymer and elastic yarn composed thereof | TEIJIN LTD (JP) | 1999-09-22 | — | — | EP | claimed |
| US-5384184-A | Heat resistant yarns | TEIJIN LIMITED (JP) | 1995-01-24 | — | — | US | claimed |
| EP-0544032-A1 | Polyester block copolymer and elastic yarn composed thereof | TEIJIN LIMITED (JP) | 1993-06-02 | — | — | EP | claimed |
| EP-1478668-B1 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | SHOWA DENKO KK (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-7341828-B2 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20050153231-A1 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2005-07-14 | — | — | US | disclosed |
| EP-1478668-A2 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | Showa Denko K.K. (JP) | 2004-11-24 | — | — | EP | disclosed |
| WO-2003072614-A2 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | SHOWA DENKO K.K. (JP) | 2003-09-04 | — | — | WO | disclosed |
| US-4417018-A | ORGANIC HALOGEN COMPOUND, ANTIMONY OXIDE TREATED WITH ALKOXYSILANE, POLYESTERS, MOLDINGS WITH IMPROVED STRENGTH DUE TO THERMOSTABILITY | TEIJIN LIMITED (JP) | 1983-11-22 | — | — | US | disclosed |
| EP-0065777-A1 | Flame-retardant resin composition | TEIJIN LIMITED (JP) | 1982-12-01 | — | — | EP | disclosed |