Fluoride Ion

Fluoride Ion

SCHEMBL49838

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nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL8829011 0.82
Fluoride SCHEMBL9623826 0.82
Fluoride Ion SCHEMBL18042661 0.82 CA4 (0.33)
Fluoride Ion SCHEMBL6571758 0.82
Fluoride Ion SCHEMBL1358915 0.82
Fluoride Ion SCHEMBL5366651 0.82
Ammonia Solution, Strong SCHEMBL5486324 0.82
Fluoride Ion SCHEMBL18042656 0.82
SCHEMBL27427293 0.71
SCHEMBL27414237 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 16885 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116344536-B Semiconductor structure and forming method thereof SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORP. (CN) 2026-05-26 CN claimed
CN-117660916-B Thick tungsten coating, preparation method thereof and plasma-facing component Xiamen Tungsten Co.,Ltd. (CN) 2026-05-26 CN claimed
WO-2026106608-A1 METAL-CONTAINING MATERIAL ETCH METHODS APPLIED MATERIALS, INC. (US) 2026-05-21 WO claimed
WO-2026106606-A1 SELECTIVE REMOVAL OF METAL-AND-CARBON-CONTAINING MATERIALS APPLIED MATERIALS, INC. (US) 2026-05-21 WO claimed
WO-2026106846-A1 METHOD FOR TUNGSTEN-BASED THIN FILM DEPOSITION VIA FABRICATION AND DECOMPOSITION OF PRECURSOR METASTABLE COMPLEXES (MOLECULAR SPECIES) KALARK NANOSTRUCTURE SCIENCES INC. (US) 2026-05-21 WO claimed
US-12635434-B2 High aspect ratio contact etching with additive gas TOKYO ELECTRON LIMITED (JP) 2026-05-19 US claimed
CN-122050908-A Silver-tungsten double-shell copper-clad powder, preparation method thereof and conductive slurry 苏州青亭电子材料有限公司 2026-05-15 CN claimed
CN-122054985-A Forming method of tungsten nucleation layer and semiconductor structure 湖北星辰技术有限公司 2026-05-15 CN claimed
US-20260136633-A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-05-14 US claimed
US-20260132506-A1 METHOD FOR TUNGSTEN-BASED THIN FILM DEPOSITION VIA FABRICATION AND DECOMPOSITION OF PRECURSOR METASTABLE COMPLEXES (MOLECULAR SPECIES) KALARK NANOSTRUCTURE SCIENCES INC (US) 2026-05-14 US claimed
US-4265982-A VAPOR DEPOSITION OF METALS IN A FLUIDIZED BED THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) 1981-05-05 US claimed
US-4232180-A PENTENE AND CYCLOPENTENE, CATALYST OF ALKYLALUMINUM CHLORIDE, TUNGSTEN HALIDE AND AN ALCOHOL THE GOODYEAR TIRE & RUBBER COMPANY (US) 1980-11-04 US claimed
EP-0015732-A1 Silicon solar cells WESTINGHOUSE ELECTRIC CORPORATION (US) 1980-09-17 EP claimed
US-4202080-A Mass spectrometer filter U.T.I.-Spectrotherm Corporation (US) 1980-05-13 US claimed
US-4172159-A INPINGEMENT OF ORGANOTIN COMPOUND SAINT-GOBAIN INDUSTRIES (FR) 1979-10-23 US claimed
US-4162345-A Deposition method and products CHEMETAL CORPORATION (US) 1979-07-24 US claimed
US-4147820-A Deposition method and products CHEMETAL CORPORATION (US) 1979-04-03 US claimed
US-3995011-A Preparation of tungsten hexafluoride from halogen and hydrogen fluoride OLIN CORPORATION (US) 1976-11-30 US claimed
US-3991155-A Isotopic enrichment of uranium hexafluoride in 235-uranium WARD JOHN CLIVE 1976-11-09 US claimed
US-3959234-A CATALYSTS OF ORGANOALUMINUM COMPOUNDS AND A TUNGSTEN OR MOLYBDENUM COMPOUND, RING-OPENING SHOWA DENKO KABUSHIKI KAISHA (JA) 1976-05-25 US claimed