Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM1A | O60341 | 1/20 | 0.52 |
| ▸ | CES2 | O00748 | 3/20 | 0.44 |
| ▸ | CES1 | P23141 | 3/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | DEGS1 | O15121 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | DAO | P14920 | 1/20 | 0.39 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.38 |
| ▸ | AKT1 | P31749 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16861481 | 1.00 | KDM1A (0.52) | KDM1ACES2CES1ATMDEGS1 | |
| SCHEMBL6138370 | 0.85 | GLA (0.44) | KDM1AALDH1A1TDP1MAPTKMT2A | |
| SCHEMBL475092 | 0.80 | KDM1A (0.48) | KDM1ACES2CES1DEGS1ALDH1A1 | |
| SCHEMBL11206059 | 0.80 | KDM1A (0.48) | KDM1ACES2CES1DEGS1ALDH1A1 | |
| SCHEMBL513852 | 0.80 | KDM1A (0.48) | KDM1ACES2CES1DEGS1ALDH1A1 | |
| SCHEMBL23458124 | 0.80 | KDM1A (0.48) | KDM1ACES2CES1DEGS1ALDH1A1 | |
| SCHEMBL395021 | 0.80 | KDM1A (0.48) | KDM1ACES2CES1DEGS1ALDH1A1 | |
| SCHEMBL23458237 | 0.80 | KDM1A (0.48) | KDM1ACES2CES1DEGS1ALDH1A1 | |
| SCHEMBL6900954 | 0.80 | KDM1A (0.48) | KDM1ACES2CES1DEGS1ALDH1A1 | |
| SCHEMBL4951375 | 0.76 | KDM1A (0.45) | KDM1ACES2CES1DEGS1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 848 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111825535-B | Polysubstituted beta-phenylpropenols compound and synthetic method and application thereof | 复旦大学 | 2022-09-23 | — | — | CN | claimed |
| CN-111825535-A | Polysubstituted beta-phenylpropenols compound and synthetic method and application thereof | 复旦大学 | 2020-10-27 | — | — | CN | claimed |
| EP-3541503-B1 | INTEGRALLY ASYMMETICAL, ISOPOROUS BLOCK COPOLYMER MEMBRANES IN FLAT SHEET GEOMETRY | HELMHOLTZ ZENTRUM GEESTHACHT (DE) | 2020-07-22 | — | — | EP | claimed |
| CN-109475822-A | The macropore or porous polymer film of doughnut geometry | 亥姆霍兹材料研究与海岸研究盖斯特哈赫特中心 | 2019-03-15 | — | — | CN | claimed |
| CN-106019846-A | Colored photosensitive resin composition, color filter and image display device | 东友精细化工有限公司 | 2016-10-12 | — | — | CN | claimed |
| US-8062825-B2 | Positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-11-22 | — | — | US | claimed |
| US-8029970-B2 | Composition for manufacturing barrier rib, and plasma display panel manufactured by the same | SAMSUNG SDI CO., LTD. (KR) | 2011-10-04 | — | — | US | claimed |
| US-7754414-B2 | Antireflective coating compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-13 | — | — | US | claimed |
| EP-2044486-A1 | ANTIREFLECTIVE COATING COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2009-04-08 | — | — | EP | claimed |
| US-20090075177-A1 | POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-19 | — | — | US | claimed |
| US-5952150-A | COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS | JSR CORPORATION (JP) | 1999-09-14 | — | — | US | claimed |
| US-5731125-A | FOR FORMING RESIST FILM | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-03-24 | — | — | US | claimed |
| EP-0819981-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-01-21 | — | — | EP | claimed |
| US-5688628-A | ACID FORMER, POLYMERS, PHENOLIC COMPOUND | NIPPON ZEON CO., LTD. (JP) | 1997-11-18 | — | — | US | claimed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | claimed |
| EP-0435418-B1 | A dispersant/antioxidant viscosity index improving lubricant additive | TEXACO DEVELOPMENT CORP (US) | 1995-01-04 | — | — | EP | claimed |
| EP-0435418-A1 | A dispersant/antioxidant viscosity index improving lubricant additive | TEXACO DEVELOPMENT CORPORATION (US) | 1991-07-03 | — | — | EP | claimed |
| EP-0367131-A2 | Light-sensitive composition | BASF Aktiengesellschaft (DE) | 1990-05-09 | — | — | EP | claimed |
| EP-0367132-A2 | Light-sensitive composition | BASF Aktiengesellschaft (DE) | 1990-05-09 | — | — | EP | claimed |
| EP-0095388-A2 | Positive-type photoresist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1983-11-30 | — | — | EP | claimed |