SCHEMBL5000738

SCHEMBL5000738

Nc1cc(C2(c3ccc(O)c(N)c3)c3cc(-c4ccccc4)ccc3-c3cccc(C#Cc4ccccc4)c32)ccc1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDE4D Q08499 13/20 0.50
KDM4E B2RXH2 2/20 0.43
MEN1 O00255 2/20 0.43
ALDH1A1 P00352 2/20 0.43
MAPT P10636 2/20 0.43
HPGD P15428 2/20 0.43
KMT2A Q03164 2/20 0.43
HSD17B10 Q99714 2/20 0.43
USP2 O75604 1/20 0.43
LMNA P02545 1/20 0.43
HSP90AA1 P07900 1/20 0.43
GAA P10253 1/20 0.43
ALOX15 P16050 1/20 0.43
ALOX12 P18054 1/20 0.43
HTT P42858 1/20 0.43
NPC1 O15118 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5000746 0.83 PDE4D (0.44) PDE4DMEN1ALDH1A1MAPTKMT2A
SCHEMBL2707921 0.79 MEN1 (0.45) PDE4DKDM4EMEN1ALDH1A1MAPT
SCHEMBL2707919 0.78 PDE4D (0.43) PDE4DKDM4EMEN1ALDH1A1MAPT
SCHEMBL16660639 0.74 PDE4D (0.82) PDE4DHTTPDK2
SCHEMBL27720234 0.73 MAPT (0.53) KDM4EMEN1ALDH1A1MAPTHPGD
SCHEMBL16652902 0.73 PDE4D (0.49) PDE4DKDM4EMEN1ALDH1A1MAPT
SCHEMBL5006707 0.70 ESR1 (0.38) PDE4DKDM4EMEN1MAPTKMT2A
SCHEMBL5000843 0.69 MEN1 (0.39) PDE4DMEN1ALDH1A1KMT2ALMNA
SCHEMBL22187643 0.69 ESR2 (0.46) KDM4EMEN1ALDH1A1MAPTHPGD
SCHEMBL31296636 0.68 ESR1 (0.65) KDM4EMEN1ALDH1A1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed