Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 4/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | AKR1C4 | P17516 | 1/20 | 0.43 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.43 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.43 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.43 |
| ▸ | NAAA | Q02083 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14989179 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL63310 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL14989245 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL21385065 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL21384980 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL17798912 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL9718193 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL14989264 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL22471851 | 0.85 | BID (0.49) | ALDH1A1MAPT | |
| SCHEMBL350450 | 0.85 | BID (0.49) | ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-7462678-B2 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-7268201-B2 | Insulating-film forming material and insulating film using the same | FUJIFILM CORPORATION (JP) | 2007-09-11 | — | — | US | disclosed |
| US-7166362-B2 | Film-forming composition, production process therefor, and porous insulating film | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-23 | — | — | US | disclosed |
| US-7144970-B2 | Insulating-film forming material and insulating film using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-12-05 | — | — | US | disclosed |
| EP-1253175-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-10-11 | — | — | EP | disclosed |
| US-20050096415-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20050074556-A1 | Film-forming composition, production process therefor, and porous insulating film | FUJI PHOTO FILM CO., LTD. | 2005-04-07 | — | — | US | disclosed |
| EP-1520891-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR Corporation (JP) | 2005-04-06 | — | — | EP | disclosed |
| US-20040198922-A1 | Insulating-film forming material and insulating film using the same | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-20040198855-A1 | Insulating-film forming material and insulating film using the same | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-6800330-B2 | PRODUCT OBTAINED BY HYDROLYZING AND CONDENSING AT LEAST ONE SILANE COMPOUND, A COMPOUND COMPATIBLE WITH OR DISPERSIBLE IN THAT COMPOUND AND HAVING A BOILING POINT OR DECOMPOSITION TEMPERATURE OF 250-450 DEGREES C, SOLVENT | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20020189495-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| EP-1253175-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |