Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.36 |
| ▸ | HTR2A | P28223 | 1/20 | 0.36 |
| ▸ | HTR2C | P28335 | 1/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.36 |
| ▸ | HRH1 | P35367 | 1/20 | 0.36 |
| ▸ | DRD3 | P35462 | 1/20 | 0.36 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.36 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.36 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | PGD | P52209 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | GPR84 | Q9NQS5 | 3/20 | 0.30 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.30 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.30 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1532634 | 1.00 | TDP1 (0.36) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL7514176 | 1.00 | TDP1 (0.36) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL3696339 | 0.77 | TDP1 (0.36) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL1568445 | 0.77 | CETP (0.42) | TDP1SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL1931058 | 0.77 | TDP1 (0.36) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL499816 | 0.77 | TDP1 (0.36) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL13761133 | 0.74 | TDP1 (0.50) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL4756190 | 0.74 | TDP1 (0.50) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL1604267 | 0.74 | TDP1 (0.50) | TDP1CHRM1AKR1A1CHRM3HTR2A | |
| SCHEMBL9494582 | 0.72 | GRIK1 (0.36) | TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-2040343-A | — | — | None | — | — | JP | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| US-8105760-B2 | Patterning process and pattern surface coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20110305979-A1 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-12-15 | — | — | US | disclosed |
| US-20110123925-A1 | POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME | CHEIL INDUSTRIES, INC. (KR) | 2011-05-26 | — | — | US | disclosed |
| US-20100086878-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7297461-B2 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| US-20060194143-A1 | Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-08-31 | — | — | US | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| US-6852664-B2 | Double metal cyanide catalysts for the preparation of polyether polyols | BAYER AKTIENGESELLSCHAFT (DE) | 2005-02-08 | — | — | US | disclosed |
| US-20040092389-A1 | Double metal cyanide catalysts for the preparation of polyether polyols | BAYER AKTIENGESELLSCHAFT (DE) | 2004-05-13 | — | — | US | disclosed |
| JP-H0240343-A | FLUORINE-CONTAINING POLYESTER AND PRODUCTION THEREOF | MEITO SANGYO KK | 1990-02-09 | — | — | JP | disclosed |