SCHEMBL5006435

SCHEMBL5006435

C[CH]SC(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3389326 0.69
SCHEMBL8171982 0.64
SCHEMBL7952965 0.64
SCHEMBL4581290 0.64
Isopropyl Alcohol SCHEMBL9464841 0.62
SCHEMBL8166116 0.59
SCHEMBL8179224 0.59
SCHEMBL51387 0.59
SCHEMBL1216762 0.59
SCHEMBL2547986 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8557943-B2 Nanostructured organosilicates from thermally curable block copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-10-15 US claimed
WO-2012148659-A2 NANOSTRUCTURED ORGANOSILICATES FROM THERMALLY CURABLE BLOCK COPOLYMERS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-11-01 WO claimed
US-20120277339-A1 Nanostructured Organosilicates from Thermally Curable Block Copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-11-01 US claimed
US-8557943-B2 Nanostructured organosilicates from thermally curable block copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-10-15 US disclosed
WO-2012148659-A2 NANOSTRUCTURED ORGANOSILICATES FROM THERMALLY CURABLE BLOCK COPOLYMERS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-11-01 WO disclosed
US-20120277339-A1 Nanostructured Organosilicates from Thermally Curable Block Copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-11-01 US disclosed
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 US disclosed
EP-1431813-B1 Photothermographic material with high iodide content and image forming method using same FUJI PHOTO FILM CO LTD (JP) 2007-02-14 EP disclosed
US-20040137389-A1 Heat-developable light-sensitive material FUJIFILM CORPORATION (JP) 2004-07-15 US disclosed
US-20040131983-A1 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2004-07-08 US disclosed
EP-1431813-A1 Photothermographic material and image forming method using same FUJI PHOTO FILM CO., LTD. (JP) 2004-06-23 EP disclosed
EP-0098743-B1 PHENYL ALPHA-ACYLOXYACETAMIDE DERIVATES AND THEIR THERAPEUTIC USE Yu, Ruey J., Dr. (US) 1988-09-28 EP disclosed
US-4518789-A Phenyl alpha-acyloxyacetamide derivatives and their therapeutic use YU RUEY J 1985-05-21 US disclosed
EP-0098743-A1 Phenyl alpha-acyloxyacetamide derivates and their therapeutic use Yu, Ruey J., Dr. (US) 1984-01-18 EP disclosed