Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | APP | P05067 | 5/20 | 0.36 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9770214 | 0.92 | TSHR (0.47) | KDM4ETSHRHPGDTDP1APP | |
| SCHEMBL8144058 | 0.91 | TDP1 (0.41) | KDM4ETSHRHPGDTDP1APP | |
| SCHEMBL18978908 | 0.90 | TDP1 (0.40) | KDM4ETSHRHPGDTDP1APP | |
| SCHEMBL678004 | 0.90 | TSHR (0.49) | KDM4ETSHRHPGDTDP1APP | |
| SCHEMBL7748033 | 0.89 | TSHR (0.45) | KDM4ETSHRTDP1HDAC3 | |
| SCHEMBL3810349 | 0.88 | KDM4E (0.39) | KDM4ETSHRTDP1APPHCAR2 | |
| SCHEMBL10906591 | 0.88 | TSHR (0.43) | KDM4ETSHRHPGDTDP1APP | |
| SCHEMBL10405267 | 0.88 | TSHR (0.38) | TSHRTDP1THRB | |
| SCHEMBL970624 | 0.86 | TSHR (0.41) | KDM4ETSHRHPGDTDP1APP | |
| SCHEMBL10905439 | 0.86 | TSHR (0.41) | KDM4ETSHRHPGDTDP1APP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7442495-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2008-10-28 | — | — | US | disclosed |
| US-7150963-B2 | Silver halide emulsion, silver halide photosensitive material, and photothermographic material | FUJI PHOTO FILM CO., LTD. (JP) | 2006-12-19 | — | — | US | disclosed |
| US-20060160039-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2006-07-20 | — | — | US | disclosed |
| US-6930698-B2 | Image formation on heat-developable light-sensitive material and image forming apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-16 | — | — | US | disclosed |
| US-20050058956-A1 | Silver halide emulsion, silver halide photosensitive material, and photothermographic material | FUJIFILM CORPORATION (JP) | 2005-03-17 | — | — | US | disclosed |
| US-20050024469-A1 | Image formation on heat-developable light-sensitive material and image forming apparatus | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |
| US-6814506-B2 | Method of density correction in heat developing apparatus and heat developing apparatus capable of density correction | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-09 | — | — | US | disclosed |
| US-6791593-B2 | Image formation on heat-developable light-sensitive material and image forming apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-14 | — | — | US | disclosed |
| US-6762016-B2 | PHOTOSENSITIVE SILVER HALIDE, A PHOTO-INSENSITIVE ORGANIC SILVER SALT, A REDUCING AGENT FOR SILVER ION AND A BINDER, ONE OF WHICH CONTAINS AN OXAZOLINE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 2004-07-13 | — | — | US | disclosed |
| US-20030219248-A1 | Method of density correction in heat developing apparatus and heat developing apparatus capable of density correction | FUJI PHOTO FILM CO., LTD. | 2003-11-27 | — | — | US | disclosed |
| US-20030091347-A1 | Image formation on heat-developable light-sensitive material and image forming apparatus | FUJI PHOTO FILM CO., LTD. | 2003-05-15 | — | — | US | disclosed |
| EP-1276006-A1 | Image formation on heat-developable light-sensitive material and image forming apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-15 | — | — | EP | disclosed |
| US-20020068245-A1 | Photothermographic material and heat development process | FUJIFILM CORPORATION (JP) | 2002-06-06 | — | — | US | disclosed |
| US-20020064737-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |