Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.33 |
| ▸ | RELA | Q04206 | 1/20 | 0.32 |
| ▸ | FBP1 | P09467 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | TLR4 | O00206 | 1/20 | 0.31 |
| ▸ | TLR2 | O60603 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27800965 | 0.88 | TP53 (0.38) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL5016969 | 0.88 | TP53 (0.42) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL27509493 | 0.87 | TP53 (0.37) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL27491677 | 0.86 | TLR4 (0.41) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL27585431 | 0.85 | TDP1 (0.35) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL27492023 | 0.85 | TLR4 (0.38) | TP53TDP1TLR4TLR2TSHR | |
| SCHEMBL27563752 | 0.85 | MAOB (0.43) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL409170 | 0.84 | TP53 (0.42) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL7776977 | 0.84 | TP53 (0.42) | TP53TDP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL27821869 | 0.84 | TSHR (0.40) | TP53TDP1TLR4TLR2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0588544-A2 | Fine pattern forming material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-03-23 | — | — | EP | claimed |
| CN-1989455-B | Oxime derivatives and the use therof as latent acids | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2011-12-21 | — | — | CN | disclosed |
| CN-101473268-A | Oxime sulfonates and the use therof as latent acids | CIBA HOLDING INC (CH) | 2009-07-01 | — | — | CN | disclosed |
| US-7423102-B2 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-09 | — | — | US | disclosed |
| CN-1989455-A | Oxime derivatives and the use therof as latent acids | CIBA SC HOLDING AG (CH) | 2007-06-27 | — | — | CN | disclosed |
| US-20060073411-A1 | Chemically amplified resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-04-06 | — | — | US | disclosed |
| US-20060014913-A1 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-01-19 | — | — | US | disclosed |
| CN-1213343-C | Iodonium salt used as potential acid provider | CIBA SPECIATY CHEMICALS HOLDIN (CH) | 2005-08-03 | — | — | CN | disclosed |
| EP-0789279-B2 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2004-12-08 | — | — | EP | disclosed |
| US-20040191674-A1 | Chemical amplification resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-09-30 | — | — | US | disclosed |
| US-5976759-A | ALKALI SOLUBLE BY HEATING | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| EP-0520642-B1 | Resist material and pattern formation process | WAKO PURE CHEM IND LTD (JP) | 1998-10-28 | — | — | EP | disclosed |
| US-5670299-A | COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-09-23 | — | — | US | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |