SCHEMBL502147

SCHEMBL502147

C1CCc2[nH]nnc2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18761546 0.97 TSHR (0.31)
SCHEMBL8012667 0.97 TSHR (0.31)
SCHEMBL8012316 0.97 TSHR (0.31)
SCHEMBL18650247 0.97 HCAR2 (0.33)
SCHEMBL19545932 0.97 TSHR (0.31)
SCHEMBL19503245 0.97 TSHR (0.31)
SCHEMBL19652049 0.95 HCAR2 (0.34)
SCHEMBL31325860 0.95
SCHEMBL19661358 0.90 HCAR2 (0.32)
SCHEMBL18761573 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 861 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4704830-A2 MRGPRX2 INHIBITORS AND METHODS OF USE THEREOF Septerna, Inc. (US) 2026-03-11 EP claimed
CN-111989621-B Stripper composition for removing photoresist and method of stripping photoresist using the same 株式会社LG化学 2024-11-26 CN claimed
WO-2024226914-A2 MRGPRX2 ANTAGONISTS AND METHODS OF USE THEREOF SEPTERNA, INC. (US) 2024-10-31 WO claimed
CN-113138544-B Stripper composition for removing photoresist and method of stripping photoresist using the same 株式会社LG化学 2024-09-13 CN claimed
CN-116149148-A Stripper composition for removing photoresist and stripping method of photoresist using the same 株式会社LG化学 2023-05-23 CN claimed
US-11168239-B2 Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors BASF SE 2021-11-09 US claimed
CN-113138544-A Stripper composition for removing photoresist and method for stripping photoresist using the same 株式会社LG化学 2021-07-20 CN claimed
CN-111989621-A Stripper composition for removing photoresist and method for stripping photoresist using the same 株式会社LG化学 2020-11-24 CN claimed
WO-2020197014-A1 PHOTORESIST-REMOVING STRIPPER COMPOSITION AND METHOD FOR STRIPPING PHOTORESIST USING SAME 주식회사 엘지화학 2020-10-01 WO claimed
CN-105378011-B Chemical mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors 巴斯夫欧洲公司 2020-07-07 CN claimed
EP-1458449-A1 AMMONIUM POLYPHOSPHATE SOLUTIONS CONTAINING MULTI-FUNCTIONAL PHOSPHONATE CORROSION INHIBITORS ASTARIS LLC (US) 2004-09-22 EP claimed
EP-1343855-A2 FIRE RETARDANT COMPOSITIONS WITH REDUCED ALUMINUM CORROSIVITY ASTARIS LLC (US) 2003-09-17 EP claimed
EP-1341586-A2 FIRE RETARDANT COMPOSITIONS CONTAINING AMMONIUM POLYPHOSPHATE AND IRON ADDITIVES FOR CORROSION INHIBITION ASTARIS LLC (US) 2003-09-10 EP claimed
WO-2003057317-A1 AMMONIUM POLYPHOSPHATE SOLUTIONS CONTAINING MULTI-FUNCTIONAL PHOSPHONATE CORROSION INHIBITORS ASTARIS LLC (US) 2003-07-17 WO claimed
US-20030066990-A1 Ammonium polyphosphate solutions containing multi-functional phosphonate corrosion inhibitors PERIMETER SOLUTIONS LP (F/K/A ICL PERFORMANCE PRODUCTS LP) 2003-04-10 US claimed
US-20020096668-A1 Fire retardant compositions with reduced aluminum corrosivity PERIMETER SOLUTIONS LP (F/K/A ICL PERFORMANCE PRODUCTS LP) 2002-07-25 US claimed
WO-2002044305-A2 FIRE RETARDANT COMPOSITIONS WITH REDUCED ALUMINUM CORROSIVITY ASTARIS LLC (US) 2002-06-06 WO claimed
WO-2002043812-A2 FIRE RETARDANT COMPOSITIONS CONTAINING AMMONIUM POLYPHOSPHATE AND IRON ADDITIVES FOR CORROSION INHIBITION ASTARIS LLC (US) 2002-06-06 WO claimed
WO-2000044034-A1 METHODS AND CLEANING SOLUTIONS FOR POST-CHEMICAL MECHANICAL POLISHING SPEEDFAM-IPEC CORPORATION (US) 2000-07-27 WO claimed
EP-0610155-A1 Stabilized polyamide compositions CIBA-GEIGY AG (CH) 1994-08-10 EP claimed