SCHEMBL5026550

SCHEMBL5026550

C=CC(N)c1ccc2cccc3c2c1C(=O)NC3=O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PARP1 P09874 3/20 0.50
▸ NPSR1 Q6W5P4 2/20 0.38
▸ CASP7 P55210 3/20 0.37
▸ MEN1 O00255 3/20 0.37
▸ KMT2A Q03164 3/20 0.37
▸ CYP3A4 P08684 2/20 0.37
▸ CASP1 P29466 2/20 0.37
▸ RGS12 O14924 1/20 0.37
▸ USP2 O75604 1/20 0.37
▸ CYP1A2 P05177 1/20 0.37
▸ POLB P06746 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ THRB P10828 1/20 0.37
▸ CYP2C9 P11712 1/20 0.37
▸ APEX1 P27695 1/20 0.37
▸ BRCA1 P38398 1/20 0.37
▸ MTOR P42345 1/20 0.37
▸ RECQL P46063 1/20 0.37
▸ BLM P54132 1/20 0.37
▸ GNAI1 P63096 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4975646 0.83 KDM4E (0.42) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL28871296 0.82 PARP1 (0.54) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL28871497 0.78 PARP1 (0.50) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL28287602 0.76 PARP1 (0.50) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL339347 0.73 PARP1 (0.63) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL21450709 0.73 PARP1 (0.63) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL8518060 0.72 PARP1 (0.53) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL29089233 0.71 PARP1 (0.66) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL6848270 0.70 PARP1 (0.63) PARP1NPSR1CASP7MEN1KMT2A
SCHEMBL1756367 0.70 PARP1 (0.63) PARP1NPSR1CASP7MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109554004-B Pigment dispersants and their use 江苏丽王科技股份有限公司 2024-02-20 — — CN disclosed
CN-109554004-B Pigment dispersants and their use 江苏丽王科技股份有限公司 2024-02-20 — — CN disclosed
US-8211613-B2 prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure DAI NIPPON PRINTING CO., LTD. (JP) 2012-07-03 — — US disclosed
US-20080275154-A1 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition SAKAYORI KATSUYA 2008-11-06 — — US disclosed
US-7410746-B2 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition DAI NIPPON PRINTING CO., LTD. (JP) 2008-08-12 — — US disclosed
US-20040023159-A1 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition DAI NIPPON PRINTING CO., LTD. (JP) 2004-02-05 — — US disclosed
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