⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11761472 | 0.70 | — | — | |
| SCHEMBL12159533 | 0.70 | — | — | |
| SCHEMBL514674 | 0.70 | — | — | |
| N,N-Dimethylethanaminium SCHEMBL16338 | 0.67 | — | — | |
| N,N-Dimethylethanaminium SCHEMBL2146567 | 0.67 | TSHR (0.36) | — | |
| N,N-Dimethylethanaminium SCHEMBL352062 | 0.67 | — | — | |
| SCHEMBL27678628 | 0.67 | — | — | |
| SCHEMBL9984801 | 0.65 | — | — | |
| N,N-Dimethylethanaminium SCHEMBL321085 | 0.63 | — | — | |
| SCHEMBL1363064 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107660209-A | Boron-containing compounds, compositions and methods for depositing boron-containing films | 弗萨姆材料美国有限责任公司 | 2018-02-02 | — | — | CN | claimed |
| CN-106367730-A | Methods for depositing group 13 metal or metalloid nitride films | 气体产品与化学公司 | 2017-02-01 | — | — | CN | claimed |
| CN-103219434-A | Composite substrate, manufacturing method thereof and light emitting component | CHEN MINZHANG | 2013-07-24 | — | — | CN | claimed |
| CN-114424676-A | Ultra-thin conformal coatings for static dissipation in semiconductor processing tools | 应用材料公司 | 2022-04-29 | — | — | CN | disclosed |
| CN-110344024-A | Zone controlled rare earth oxide ALD and CVD coatings | 应用材料公司 | 2019-10-18 | — | — | CN | disclosed |
| CN-209104115-U | The product of protection is corroded with multilayer plasma body | 应用材料公司 | 2019-07-12 | — | — | CN | disclosed |
| CN-108878246-A | Multilayer plasma body for chamber part corrodes protection | 应用材料公司 | 2018-11-23 | — | — | CN | disclosed |
| CN-108474114-A | Method for depositing conformal metal or metalloid silicon nitride films | 弗萨姆材料美国有限责任公司 | 2018-08-31 | — | — | CN | disclosed |
| CN-108026637-A | Method for depositing conformal metal or metalloid silicon nitride films and resulting films | 弗萨姆材料美国有限责任公司 | 2018-05-11 | — | — | CN | disclosed |
| CN-107660209-A | Boron-containing compounds, compositions and methods for depositing boron-containing films | 弗萨姆材料美国有限责任公司 | 2018-02-02 | — | — | CN | disclosed |
| CN-106367730-A | Methods for depositing group 13 metal or metalloid nitride films | 气体产品与化学公司 | 2017-02-01 | — | — | CN | disclosed |
| CN-101521281-B | Low cost fuel cell bipolar plate and manufacture method thereof | GM GLOBAL TECHNOLOGY OPERATIONS, INC. (US) | 2015-12-02 | — | — | CN | disclosed |
| CN-103219434-A | Composite substrate, manufacturing method thereof and light emitting component | CHEN MINZHANG | 2013-07-24 | — | — | CN | disclosed |
| WO-2012015744-A1 | ROTATING REACTOR ASSEMBLY FOR DEPOSITING FILM ON SUBSTRATE | SYNOS TECHNOLOGY, INC. (US) | 2012-02-02 | — | — | WO | disclosed |
| US-20120027953-A1 | Rotating Reactor Assembly for Depositing Film on Substrate | SYNOS TECHNOLOGY, INC. (US) | 2012-02-02 | — | — | US | disclosed |
| CN-101521281-A | Low cost fuel cell bipolar plate and process of making the same | GM GLOBAL TECH OPERATIONS INC | 2009-09-02 | — | — | CN | disclosed |
| CN-101121734-A | Organometallic compounds | ROHM & HAAS ELECT MAT (US) | 2008-02-13 | — | — | CN | disclosed |