SCHEMBL503244

SCHEMBL503244

C[C@]1(C(=O)O)C[C@](C)(C(=O)O)C[C@@](C)(C(=O)O)C1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.65
MAPK1 P28482 3/20 0.36
TP53 P04637 1/20 0.36
NFKB1 P19838 1/20 0.36
CYP2C19 P33261 1/20 0.36
THPO P40225 1/20 0.36
STAT6 P42226 1/20 0.36
HIF1A Q16665 1/20 0.36
NPC1 O15118 1/20 0.36
GMNN O75496 1/20 0.36
LMNA P02545 1/20 0.36
MTOR P42345 1/20 0.36
RAB9A P51151 1/20 0.36
BLM P54132 1/20 0.36
PMP22 Q01453 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
APLNR P35414 1/20 0.35
PKM P14618 1/20 0.33
LCK P06239 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13490845 1.00 FFAR3 (0.65) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL405480 1.00 FFAR3 (0.65) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL14012097 1.00 FFAR3 (0.65) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL4442780 1.00 FFAR3 (0.65) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL13315169 0.88 FFAR3 (0.52) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL17893189 0.87 FFAR3 (0.77) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL17893191 0.87 FFAR3 (0.77) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL17893188 0.87 FFAR3 (0.77) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL26409341 0.87 FFAR3 (0.58) FFAR3MAPK1TP53NFKB1CYP2C19
SCHEMBL16983813 0.86 FFAR3 (0.50) FFAR3MAPK1TP53NFKB1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110088167-B Glycolic acid polymers 索尔维公司 2022-02-08 CN disclosed
US-9278909-B2 Amide-extended crosslinking compounds and methods for use thereof DESIGNER MOLECULES, INC. (US) 2016-03-08 US disclosed
US-20140147794-A1 METHOD OF FORMING PHOTORESIST PATTERN JSR CORPORATION (JP) 2014-05-29 US disclosed
US-8637611-B2 Amide-extended crosslinking compounds and methods for use thereof DESIGNER MOLECULES, INC. (US) 2014-01-28 US disclosed
US-20130338313-A1 AMIDE-EXTENDED CROSSLINKING COMPOUNDS AND METHODS FOR USE THEREOF DESIGNER MOLECULES, INC. (US) 2013-12-19 US disclosed
US-20130203895-A1 CURING AGENTS FOR EPOXY RESINS DESIGNER MOLECULES, INC. (US) 2013-08-08 US disclosed
US-20130199724-A1 CURATIVES FOR EPOXY COMPOSITIONS DESIGNER MOLECULES, INC. (US) 2013-08-08 US disclosed
US-8435718-B2 Upper layer-forming composition and photoresist patterning method JSR CORPORATION (JP) 2013-05-07 US disclosed
US-20130012620-A1 CURING AGENTS FOR EPOXY RESINS DESIGNER MOLECULES, INC. (US) 2013-01-10 US disclosed
US-8288591-B2 Curing agents for epoxy resins DESIGNER MOLECULES, INC. (US) 2012-10-16 US disclosed
EP-0897943-B1 Composite resin composition MITSUI CHEMICALS INC (JP) 2005-05-04 EP disclosed
EP-1148075-B1 PROCESS FOR PRODUCING ALIPHATIC POLYESTER WITH EXCELLENT STABILITY MITSUI CHEMICALS INC (JP) 2004-05-19 EP disclosed
US-6667194-B1 Method of bonding die chip with underfill fluxing composition HENKEL LOCTITE CORPORATION 2003-12-23 US disclosed
US-20030035917-A1 Image making medium HYMAN SYDNEY (US) 2003-02-20 US disclosed
EP-1148075-A1 PROCESS FOR PRODUCING ALIPHATIC POLYESTER WITH EXCELLENT STABILITY Mitsui Chemicals, Inc. (JP) 2001-10-24 EP disclosed
US-6150438-A HEATING AND REACTING AN ALIPHATIC POLYESTER RESIN WITH HYDROXYCARBOXYLIC ACID UNITS AND UNSATURATED CARBOXYLIC ACID TO FORM A MODIFIED ALIPHATIC POLYESTER, KNEADING AND BONDING WITH A BIOMASS SELECTED FROM CELLULOSE, LIGNOCELLULOSE MITSUI CHEMICALS, INC. (JP) 2000-11-21 US disclosed
US-6140458-A STARTING MATERIAL IS AN EASILY-AVAILABLE, LOW-MOLECULAR ALIPHATIC POLYESTER PREPOLYMER TO BE PREPARED THROUGH POLYCONDENSATION OF INEXPENSIVE MATERIALS OF AN ALIPHATIC HYDROXYCARBOXYLIC ACID; HIGH MOLECULAR WEIGHT MITSUI CHEMICALS, INC. (JP) 2000-10-31 US disclosed
US-6124384-A Composite resin composition MITSUI CHEMICALS, INC. (JP) 2000-09-26 US disclosed
EP-0953589-A2 Process for preparing aliphatic hydroxycarboxylic acid polyesters Mitsui Chemicals, Inc. (JP) 1999-11-03 EP disclosed
EP-0897943-A2 Composite resin composition Mitsui Chemicals, Inc. (JP) 1999-02-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130012620-A1 CURING AGENTS FOR EPOXY RESINS DOT1L, EHMT1, ASH1L FFAR3 1230/4885MAPK1 3452/4885TP53 2583/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.