⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6316534 | 0.75 | — | — | |
| SCHEMBL7470757 | 0.72 | — | — | |
| SCHEMBL7470760 | 0.72 | — | — | |
| SCHEMBL7470765 | 0.72 | — | — | |
| SCHEMBL333483 | 0.69 | — | — | |
| SCHEMBL12476944 | 0.67 | — | — | |
| SCHEMBL799003 | 0.67 | — | — | |
| SCHEMBL8053280 | 0.67 | — | — | |
| SCHEMBL6873878 | 0.67 | GABRR1 (0.36) | — | |
| SCHEMBL1221136 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | claimed |
| EP-1597627-A4 | DISSOLUTION RATE MODIFIERS FOR PHOTORESIST COMPOSITIONS | PROMERUS LLC (US) | 2008-01-09 | — | — | EP | disclosed |
| EP-1597627-A2 | DISSOLUTION RATE MODIFIERS FOR PHOTORESIST COMPOSITIONS | Promerus LLC (US) | 2005-11-23 | — | — | EP | disclosed |
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | disclosed |
| EP-1501877-A1 | FLUORINATED POLYMERS | Honeywell International Inc. (US) | 2005-02-02 | — | — | EP | disclosed |
| WO-2004074933-A2 | DISSOLUTION RATE MODIFIERS FOR PHOTORESIST COMPOSITIONS | PROMERUS LLC (US) | 2004-09-02 | — | — | WO | disclosed |
| US-20040126695-A1 | Fluorinated polymers | HONEYWELL INTERNATIONAL, INC. | 2004-07-01 | — | — | US | disclosed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | disclosed |
| WO-2003095505-A1 | FLUORINATED POLYMERS | HONEYWELL INTERNATIONAL INC. (US) | 2003-11-20 | — | — | WO | disclosed |
| JP-2002241330-A | METHOD FOR PURIFYING BISTRIFLUOROMETHYLHYDROXYBUTENE-1 | CENTRAL GLASS CO LTD | 2002-08-28 | — | — | JP | disclosed |