Benzene

Benzene

SCHEMBL50472

CCCCCCCCCCCC[Na].c1ccccc1

nearest known ligand 0.50

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 3/20 0.50
▸ THRB P10828 1/20 0.50
▸ CHRM2 P08172 2/20 0.44
▸ ADRA2A P08913 2/20 0.44
▸ ADORA3 P0DMS8 2/20 0.44
▸ CHRM1 P11229 2/20 0.44
▸ ACHE P22303 2/20 0.44
▸ SLC6A2 P23975 2/20 0.44
▸ SLC6A4 P31645 2/20 0.44
▸ SLC6A3 Q01959 2/20 0.44
▸ ABCB11 O95342 1/20 0.44
▸ ESR1 P03372 1/20 0.44
▸ PGR P06401 1/20 0.44
▸ HTR1A P08908 1/20 0.44
▸ DRD1 P21728 1/20 0.44
▸ TBXA2R P21731 1/20 0.44
▸ PTGS1 P23219 1/20 0.44
▸ PDE4A P27815 1/20 0.44
▸ ADRA1A P35348 1/20 0.44
▸ OPRM1 P35372 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL8003017 1.00 TSHR (0.50) TSHRTHRBCHRM2ADRA2AADORA3
Benzene SCHEMBL10625913 1.00 TSHR (0.50) TSHRTHRBCHRM2ADRA2AADORA3
SCHEMBL843476 0.90 TSHR (0.61) TSHRTHRBKMT2ALMNAMEN1
SCHEMBL2175713 0.90 — —
SCHEMBL2537565 0.90 TSHR (0.61) TSHRTHRBKMT2ALMNAMEN1
SCHEMBL2176487 0.90 TSHR (0.61) TSHRTHRBKMT2ALMNAMEN1
SCHEMBL1714429 0.90 TSHR (0.61) TSHRTHRBKMT2ALMNAMEN1
SCHEMBL3802440 0.90 TSHR (0.61) TSHRTHRBKMT2ALMNAMEN1
SCHEMBL10949694 0.90 TSHR (0.61) TSHRTHRBKMT2ALMNAMEN1
SCHEMBL816343 0.90 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0233072-B1 IMPROVEMENTS IN OR RELATING TO RADIATION SENSITIVE MATERIAL E.I. du Pont de Nemours and Company (US) 1992-09-02 — — EP claimed
US-4902601-A Radiation sensitive polymeric diazonium salt and methods of making the polymeric diazonium salt VICKERS PLC (GB) 1990-02-20 — — US claimed
EP-0233072-A2 Improvements in or relating to radiation sensitive material E.I. du Pont de Nemours and Company (US) 1987-08-19 — — EP claimed
US-4595648-A Radiation-sensitive plates formed using diazonium salts VICKERS LIMITED (GB) 1986-06-17 — — US claimed
US-12234432-B2 Non-hydrolyzed collagen-based multiuse cleaning composition PORTILLO ROSADO ROSA MARIA (DO) 2025-02-25 — — US disclosed
EP-3988081-B1 COLLAGEN-BASED MULTIUSE CLEANING COMPOSITION PORTILLO ROSADO ROSA MARIA (DO) 2025-02-19 — — EP disclosed
CN-115433639-A Preparation method and preparation equipment of bactericidal laundry detergent 上海蜂花日用品有限公司 2022-12-06 — — CN disclosed
US-20220306967-A1 COLLAGEN-BASED MULTIUSE CLEANING COMPOSITION PORTILLO ROSADO ROSA MARIA (DO) 2022-09-29 — — US disclosed
EP-3988081-A1 COLLAGEN-BASED MULTIUSE CLEANING COMPOSITION Portillo Rosado, Rosa Maria (DO) 2022-04-27 — — EP disclosed
US-9903795-B2 Composition for high stringency cell treatment and antigen retrieval BECKMAN COULTER, INC. (US) 2018-02-27 — — US disclosed
EP-2820113-B1 PROCESSES AND COMPOSITIONS FOR CLEANING MIXING DEVICES TO IMPROVE POLYCARBONATE PRODUCTION SABIC GLOBAL TECHNOLOGIES BV (NL) 2017-07-12 — — EP disclosed
EP-2106784-B1 Hair styling composition ROHM & HAAS (US) 2015-04-22 — — EP disclosed
EP-0030862-A2 Radiation sensitive compounds, methods of producing them and radiation sensitive plates based on such materials Vickers Limited (GB) 1981-06-24 — — EP disclosed
US-4143085-A METHOD FOR ISOLATING LOW MOLECULAR WEIGHT POLYMER SUMITOMO CHEMICAL CO., LTD. (JP) 1979-03-06 — — US disclosed
US-4071463-A ANIONIC SURFACTANTS THE DOW CHEMICAL COMPANY (US) 1978-01-31 — — US disclosed
US-4020031-A POLYTHIOETHERS, ANIONIC SURFACTANT PHILLIPS PETROLEUM COMPANY (US) 1977-04-26 — — US disclosed
US-3975338-A OLEFIN ALKYL SULFONATE AND HYDROXYALKYL SULFONATE KANEGAFUCHI CHEMICAL INDUSTRIES CO., LTD. (JA) 1976-08-17 — — US disclosed
US-3963499-A Photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JA) 1976-06-15 — — US disclosed
US-3956420-A CPOLYOLEFIN COMPOSITION FOR ELECTRICAL INSULATIONFERROCENE, 8-SUBSTITUTED QUINOLINE DAINICHI-NIPPON CABLES, LTD. (JA) 1976-05-11 — — US disclosed
US-3931133-A Suspension polymerization process for ethylenic monomers AQUITAINE TOTAL ORGANICO (FR) 1976-01-06 — — US disclosed
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