SCHEMBL5050804

SCHEMBL5050804

CC(C#N)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12714097 1.00
SCHEMBL20111211 1.00
SCHEMBL15209462 0.79 TSHR (0.44)
SCHEMBL19072686 0.73 TSHR (0.39)
SCHEMBL11641828 0.73
SCHEMBL17935769 0.73 TSHR (0.39)
SCHEMBL2992474 0.73
SCHEMBL17935613 0.73 TSHR (0.39)
SCHEMBL29020050 0.72 TSHR (0.32)
SCHEMBL3882625 0.71 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025067315-A1 PROCESS OF REVERSIBLE COMPLEXATION MEDIATED POLYMERIZATION AND PRODUCT OBTAINED THEREFROM BASF SE (DE) 2025-04-03 WO claimed
EP-1016675-B1 Method of preparing a non-aqueous composite wax particle dispersion EASTMAN KODAK CO (US) 2004-07-14 EP claimed
EP-1016675-A1 Method of preparing a non-aqueous composite wax particle dispersion EASTMAN KODAK COMPANY (US) 2000-07-05 EP claimed
US-6075090-A POLYMERIZING AQUEOUS MIXTURE OF AN ACRYLIC MONOMER FREE OF IONIC GROUPS WHICH FORMS A WATER SOLUBLE HOMOPOLYMER, SECOND MONOMER WHICH FORMS WATER INSOLUBLE HOMOPOLYMER, AND WAX PARTICLES WITH AZO INITIATOR, REDISPERSING IN ORGANIC SOLVENT EASTMAN KODAK COMPANY (US) 2000-06-13 US claimed
US-20260085138-A1 REPROCESSABLE POLYMERS AND METHODS FOR THE MANUFACTURE THEREOF UNIV MASSACHUSETTS (US) 2026-03-26 US disclosed
WO-2025067315-A1 PROCESS OF REVERSIBLE COMPLEXATION MEDIATED POLYMERIZATION AND PRODUCT OBTAINED THEREFROM BASF SE (DE) 2025-04-03 WO disclosed
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20240174780-A1 HOLLOW PARTICLES AND USE THEREOF SEKISUI KASEI CO., LTD. (JP) 2024-05-30 US disclosed
US-11801238-B2 Anti-viral activity of VPS34 inhibitors DECIPHERA PHARMACEUTICALS, LLC (US) 2023-10-31 US disclosed
US-20230332006-A1 WHITE INKJET INK COMPOSITIONS COMPRISING HOLLOW COMPOSITE PARTICLES INNER MONGOLIA XIANHONG SCIENCE CO., LTD. (CN) 2023-10-19 US disclosed
US-11780858-B2 Pyridinamine-pyridone and pyrimidinamine-pyridone compounds SPRINT BIOSCIENCE AB (SE) 2023-10-10 US disclosed
US-11780858-B2 Pyridinamine-pyridone and pyrimidinamine-pyridone compounds SPRINT BIOSCIENCE AB (SE) 2023-10-10 US disclosed
US-6232029-B1 MIXTURE CONTAINING BINDER, COLORING AND INFRARED ABSORBENT NIPPON SHOKUBAI CO., LTD. (JP) 2001-05-15 US disclosed
EP-1016675-A1 Method of preparing a non-aqueous composite wax particle dispersion EASTMAN KODAK COMPANY (US) 2000-07-05 EP disclosed
US-6075090-A POLYMERIZING AQUEOUS MIXTURE OF AN ACRYLIC MONOMER FREE OF IONIC GROUPS WHICH FORMS A WATER SOLUBLE HOMOPOLYMER, SECOND MONOMER WHICH FORMS WATER INSOLUBLE HOMOPOLYMER, AND WAX PARTICLES WITH AZO INITIATOR, REDISPERSING IN ORGANIC SOLVENT EASTMAN KODAK COMPANY (US) 2000-06-13 US disclosed
EP-0987303-A1 Carbon black graft polymer Nippon Shokubai Co., Ltd. (JP) 2000-03-22 EP disclosed
EP-0850984-A1 Inorganic dispersion stabilizer and process for producing resinous particles using the same NIPPON SHOKUBAI CO., LTD. (JP) 1998-07-01 EP disclosed
US-5382727-A Free radical chlorination of 1,1-dichloroethane PPG INDUSTRIES, INC. (US) 1995-01-17 US disclosed
US-5098785-A Polyurethane, vinyl chloride copolymer, durability KONICA CORPORATION (JP) 1992-03-24 US disclosed
US-4725646-A SAPONIFICATION OF A COPOLYMERIZED CARBOXYLIC ACID VINYL ESTER CROSSLINKED BY A POLYUNSATURATED POLYETHER-CONTAINING COMPOUND JAPAN EXLAN COMPANY, LIMITED (JP) 1988-02-16 US disclosed