Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Bicarbonate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL3683461 | 0.94 | — | — | |
| Bicarbonate SCHEMBL27746400 | 0.94 | — | — | |
| Bicarbonate SCHEMBL29039469 | 0.88 | — | — | |
| Bicarbonate SCHEMBL27864505 | 0.86 | — | — | |
| Bicarbonate SCHEMBL570721 | 0.84 | CA1 (1.00) | — | |
| Bicarbonate SCHEMBL6478072 | 0.84 | CA1 (1.00) | — | |
| Bicarbonate SCHEMBL8322803 | 0.84 | CA1 (1.00) | — | |
| Bicarbonate SCHEMBL15271537 | 0.84 | — | — | |
| Bicarbonate SCHEMBL1179 | 0.84 | — | — | |
| Bicarbonate SCHEMBL1250901 | 0.84 | CA1 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119110790-A | Abrasive grains and method for selecting same, polishing liquid, multi-liquid polishing liquid, polishing method, method for producing component, and method for producing semiconductor component | 株式会社力森诺科 | 2024-12-10 | — | — | CN | claimed |
| CN-119095932-A | Abrasive grains and method for selecting same, polishing liquid, multi-liquid polishing liquid, polishing method, method for producing component, and method for producing semiconductor component | 株式会社力森诺科 | 2024-12-06 | — | — | CN | claimed |
| CN-117342610-A | Method for preparing bismuth oxide carbonate nano-micro material by dynamic conversion of light-assisted template | 北京化工大学 | 2024-01-05 | — | — | CN | claimed |
| CN-117050726-A | Polishing liquid, polishing liquid set and polishing method | 株式会社力森诺科 | 2023-11-14 | — | — | CN | claimed |
| CN-111149193-B | Polishing liquid, polishing liquid set and polishing method | 株式会社力森诺科 | 2023-09-08 | — | — | CN | claimed |
| CN-112875741-B | Broadband hydrated cerium oxycarbonate microwave absorbent, and preparation process and application thereof | 浙江师范大学 | 2022-08-12 | — | — | CN | claimed |
| CN-121823637-A | Preparation method of cerium oxide abrasive particles and cerium oxide abrasive particles | 昂士特科技(深圳)有限公司 | 2026-04-10 | — | — | CN | disclosed |
| CN-119110791-A | Abrasive grains and method for selecting same, polishing liquid, multi-liquid polishing liquid, polishing method, method for producing component, and method for producing semiconductor component | 株式会社力森诺科 | 2024-12-10 | — | — | CN | disclosed |
| CN-119110790-A | Abrasive grains and method for selecting same, polishing liquid, multi-liquid polishing liquid, polishing method, method for producing component, and method for producing semiconductor component | 株式会社力森诺科 | 2024-12-10 | — | — | CN | disclosed |
| CN-119110838-A | Raw material for obtaining abrasive grains and selection method thereof, method for producing abrasive grains, method for producing polishing liquid, polishing method, method for producing component, and method for producing semiconductor component | 株式会社力森诺科 | 2024-12-10 | — | — | CN | disclosed |
| CN-119095932-A | Abrasive grains and method for selecting same, polishing liquid, multi-liquid polishing liquid, polishing method, method for producing component, and method for producing semiconductor component | 株式会社力森诺科 | 2024-12-06 | — | — | CN | disclosed |
| CN-117342610-A | Method for preparing bismuth oxide carbonate nano-micro material by dynamic conversion of light-assisted template | 北京化工大学 | 2024-01-05 | — | — | CN | disclosed |
| CN-117050726-A | Polishing liquid, polishing liquid set and polishing method | 株式会社力森诺科 | 2023-11-14 | — | — | CN | disclosed |
| WO-2007035034-A1 | CERIUM CARBONATE POWDER, METHOD FOR PREPARING THE SAME, CERIUM OXIDE POWDER MADE THEREFROM, METHOD FOR PREPARING THE SAME, AND CMP SLURRY COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2007-03-29 | — | — | WO | disclosed |
| CN-1935927-A | Cerium oxide abrasive and method of polishing substrates | HITACHI CHEMICAL CO LTD (JP) | 2007-03-28 | — | — | CN | disclosed |
| CN-1282226-C | Cerium oxide abrasive and method for polishing substrate | HITACHI CHEMICAL CO LTD (JP) | 2006-10-25 | — | — | CN | disclosed |
| CN-1245471-C | Cerium oxide abrasive and method of polishing substrates | HITACHI CHEMICAL CO LTD (JP) | 2006-03-15 | — | — | CN | disclosed |
| CN-1526786-A | Cerium oxide abrasive material and grinding method of base plate | �������ɹ�ҵ��ʽ���� | 2004-09-08 | — | — | CN | disclosed |
| CN-1524917-A | Cerium oxide abrasive and method of polishing substrates | �������ɹ�ҵ��ʽ���� | 2004-09-01 | — | — | CN | disclosed |
| CN-1235698-A | Cerium oxide abrasive and method for polishing substrate | HITACHI CHEMICAL CO LTD (JP) | 1999-11-17 | — | — | CN | disclosed |