⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL59306 | 0.73 | — | — | |
| SCHEMBL1398334 | 0.68 | — | — | |
| SCHEMBL18302908 | 0.65 | — | — | |
| Propene SCHEMBL9545915 | 0.62 | — | — | |
| SCHEMBL3392646 | 0.62 | — | — | |
| SCHEMBL536602 | 0.60 | — | — | |
| SCHEMBL2178197 | 0.60 | — | — | |
| SCHEMBL1702201 | 0.60 | — | — | |
| SCHEMBL12971067 | 0.60 | — | — | |
| SCHEMBL9860543 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7365103-B2 | Compositions for dark-field polymerization and method of using the same for imprint lithography processes | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2008-04-29 | — | — | US | claimed |
| US-20040116548-A1 | Compositions for dark-field polymerization and method of using the same for imprint lithography processes | MOLECULAR IMPRINTS, INC. | 2004-06-17 | — | — | US | claimed |
| US-7906060-B2 | Compositions for dark-field polymerization and method of using the same for imprint lithography processes | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2011-03-15 | — | — | US | disclosed |
| US-20080230959-A1 | Compositions for Dark-Field Polymerization and Method of Using the Same for Imprint Lithography Processes | BOARD OF REGENTS, UNIVERSITY OF TEXAS SYSTEM (US) | 2008-09-25 | — | — | US | disclosed |
| US-7365103-B2 | Compositions for dark-field polymerization and method of using the same for imprint lithography processes | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2008-04-29 | — | — | US | disclosed |
| US-20040116548-A1 | Compositions for dark-field polymerization and method of using the same for imprint lithography processes | MOLECULAR IMPRINTS, INC. | 2004-06-17 | — | — | US | disclosed |