Methacrylic Acid

Methacrylic Acid

SCHEMBL505626

C=C(C)C(=O)O.CC(C)(CO)CO

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.38
TDP1 Q9NUW8 2/20 0.35
TGFBR1 P36897 1/20 0.34
KDM4E B2RXH2 1/20 0.31
FFAR1 O14842 1/20 0.31
CPT2 P23786 1/20 0.31
ALDH1A1 P00352 2/20 0.31
HMGCR P04035 1/20 0.31
CHRM1 P11229 1/20 0.31
TBXA2R P21731 1/20 0.31
ADRA1A P35348 1/20 0.31
TSHR P16473 1/20 0.30
FFAR3 O14843 1/20 0.30
LCK P06239 1/20 0.30
FYN P06241 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL8509424 1.00 TET2 (0.38) TET2TDP1TGFBR1KDM4EFFAR1
Methacrylic Acid SCHEMBL4382808 1.00 TET2 (0.38) TET2TDP1TGFBR1KDM4EFFAR1
Methacrylic Acid SCHEMBL15667140 1.00 TET2 (0.38) TET2TDP1TGFBR1KDM4EFFAR1
Methacrylic Acid SCHEMBL18812640 1.00 TET2 (0.38) TET2TDP1TGFBR1KDM4EFFAR1
Methacrylic Acid SCHEMBL23107 1.00 TET2 (0.38) TET2TDP1TGFBR1KDM4EFFAR1
Methacrylic Acid SCHEMBL23611338 1.00 TET2 (0.38) TET2TDP1TGFBR1KDM4EFFAR1
Methacrylic Acid SCHEMBL8773892 0.95 TET2 (0.35) TET2TDP1TGFBR1
Methacrylic Acid SCHEMBL9635441 0.93 TET2 (0.34) TET2TDP1TGFBR1
Methacrylic Acid SCHEMBL17474751 0.90 TET2 (0.43) TET2TDP1TGFBR1KDM4EFFAR1
Methacrylic Acid SCHEMBL3143304 0.90 TET2 (0.43) TET2TDP1TGFBR1KDM4EFFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 236 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025059244-A2 UV CURABLE COATINGS SYSTEM FOR IMPROVED SCRATCH RESISTANCE SWIMC LLC (US) 2025-03-20 WO claimed
US-20250084273-A1 UV CURABLE COATINGS SYSTEM FOR IMPROVED SCRATCH RESISTANCE SWIMC LLC 2025-03-13 US claimed
CN-118388706-A Sand-carrying drag reducer for shale oil fracturing and water-dispersible polymerization method thereof 大庆高新区华龙祥化工有限公司 2024-07-26 CN claimed
CN-108929423-B Nonionic emulsifier for water-based epoxy resin and preparation method and application thereof 万华化学集团股份有限公司 2020-11-24 CN claimed
CN-109880062-A A kind of cross-linkable solidifying material and its continuous production method 广东博兴新材料科技有限公司 2019-06-14 CN claimed
CN-106854432-B A kind of radiation solidified aqueous coating resin and preparation method thereof 万华化学集团股份有限公司 2019-04-23 CN claimed
CN-106854432-A A kind of radiation solidified aqueous coating resin and preparation method thereof 万华化学集团股份有限公司 2017-06-16 CN claimed
CN-106147620-A A kind of high resiliency accumulator sealant based on neopentyl glycol dibasic acid esters and acrylic acid methyl ester. and manufacture method 哈尔滨永淇化工有限公司 2016-11-23 CN claimed
CN-105969213-A Flame-retardant storage battery sealing adhesive based on vinyl toluene and neopentyl glycol dimethacrylate and production method of flame-retardant storage battery sealing adhesive 哈尔滨永淇化工有限公司 2016-09-28 CN claimed
EP-2197675-A1 LOW BLUSH GELCOATS HAVING HIGH COLOR FASTNESS Ashland Licensing and Intellectual Property LLC (US) 2010-06-23 EP claimed
US-20090137728-A1 Low blush gelcoats having high color fastness ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC (US) 2009-05-28 US claimed
WO-2009032056-A1 LOW BLUSH GELCOATS HAVING HIGH COLOR FASTNESS ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC (US) 2009-03-12 WO claimed
JP-3210336-A None JP disclosed
WO-2025059244-A2 UV CURABLE COATINGS SYSTEM FOR IMPROVED SCRATCH RESISTANCE SWIMC LLC (US) 2025-03-20 WO disclosed
US-20250084273-A1 UV CURABLE COATINGS SYSTEM FOR IMPROVED SCRATCH RESISTANCE SWIMC LLC 2025-03-13 US disclosed
CN-118742444-A Component part TOTO株式会社 2024-10-01 CN disclosed
US-4652604-A Radiation-polymerizable composition and element containing a photopolymer composition AMERICAN HOECHST CORPORATION (US) 1987-03-24 US disclosed
EP-0121942-B1 METHOD OF FORMING MULTILAYER COATED FILM FUJI PHOTO FILM CO., LTD. (JP) 1986-10-08 EP disclosed
US-4571316-A APPLYING NONAQUEOUS RESIN TO MOVING WEB, AND IRRADIATION TO HARDEN FUJI PHOTO FILM CO., LTD. (JP) 1986-02-18 US disclosed
EP-0121942-A1 Method of forming multilayer coated film FUJI PHOTO FILM CO., LTD. (JP) 1984-10-17 EP disclosed