⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28355978 | 0.89 | — | — | |
| SCHEMBL461234 | 0.78 | — | — | |
| SCHEMBL29176887 | 0.78 | — | — | |
| SCHEMBL8916556 | 0.78 | — | — | |
| SCHEMBL28635444 | 0.76 | — | — | |
| SCHEMBL19514066 | 0.76 | — | — | |
| SCHEMBL2046449 | 0.76 | — | — | |
| SCHEMBL29002153 | 0.75 | — | — | |
| SCHEMBL9617191 | 0.75 | — | — | |
| SCHEMBL23824973 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080292783-A1 | METHOD OF MANUFACTURING A THIN LAYER AND METHODS OF MANUFACTURING GATE STRUCTURES AND CAPACITORS USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-11-27 | — | — | US | disclosed |