⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16046303 | 0.78 | — | — | |
| SCHEMBL7111816 | 0.71 | — | — | |
| SCHEMBL3432035 | 0.69 | — | — | |
| SCHEMBL4432084 | 0.62 | — | — | |
| SCHEMBL21609598 | 0.59 | — | — | |
| Hydrochloric Acid SCHEMBL18528251 | 0.59 | — | — | |
| SCHEMBL9209369 | 0.59 | — | — | |
| SCHEMBL7571132 | 0.59 | — | — | |
| SCHEMBL23581505 | 0.56 | — | — | |
| SCHEMBL58777 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 726 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6348725-B1 | — | — | None | — | — | US | claimed |
| CN-115386295-B | Super wear-resistant high-hardness nano titanium ceramic coating and preparation method thereof | 嘉兴速迪高分子材料有限公司 | 2024-12-31 | — | — | CN | claimed |
| WO-2023173096-A1 | PYRROLOBENZODIAZEPINE INTERMEDIATES AND USES THEREOF | SIGMA-ALDRICH CO. LLC (US) | 2023-09-14 | — | — | WO | claimed |
| CN-111205288-B | Synthesis method of (1S,12bS) lactam ester compound | 四川大学 | 2021-03-30 | — | — | CN | claimed |
| CN-111205288-A | Synthesis method of (1S,12bS) lactam ester compound | 四川大学 | 2020-05-29 | — | — | CN | claimed |
| US-20190221771-A1 | BUFFER LAYER FOR ORGANIC LIGHT EMITTING DEVICES AND METHOD OF MAKING THE SAME | UNIVERSAL DISPLAY CORPORATION | 2019-07-18 | — | — | US | claimed |
| CN-109963963-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2019-07-02 | — | — | CN | claimed |
| CN-104725628-B | A kind of single functionalization branched polyethylene glycol, preparation method and its bio-related substance containing degradable group | 厦门赛诺邦格生物科技股份有限公司 | 2018-04-17 | — | — | CN | claimed |
| CN-104530417-B | A kind of multiple functionalized H types polyethyleneglycol derivative and preparation method thereof | 厦门赛诺邦格生物科技股份有限公司 | 2017-09-08 | — | — | CN | claimed |
| CN-104530415-B | A kind of different functionalization Y types polyethyleneglycol derivative, preparation method and its bio-related substance | 厦门赛诺邦格生物科技股份有限公司 | 2017-09-01 | — | — | CN | claimed |
| US-6245690-B1 | EXPOSING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITED FILM OF OXIDIZED ORGANOSILICON COMPOUND TO A HYDROPHOBIC-IMPARTING SURFACTANT SUCH AS HEXAMETHYLDISILAZANE PRIOR TO THERMALLY CURING TO CONTROL CARBON CONTENT IN DEPOSITED FILM | APPLIED MATERIALS, INC. | 2001-06-12 | — | — | US | claimed |
| US-6171945-B1 | CVD nanoporous silica low dielectric constant films | APPLIED MATERIALS, INC. | 2001-01-09 | — | — | US | claimed |
| EP-1063692-A1 | Process for depositing a low dielectric constant film | Applied Materials, Inc. (US) | 2000-12-27 | — | — | EP | claimed |
| EP-1055012-A2 | PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | Applied Materials, Inc. (US) | 2000-11-29 | — | — | EP | claimed |
| US-6107184-A | REACTING THE CONDENSED P-XYLYLENE AND A VINYL COMONOMER AT A TEMPERATURE THAT RETAINS LABILE GROUPS IN A CONFORMAL COPOLYMER LAYER, AND CURING THE COPOLYMER TO CONVERT LABILE GROUPS TO DISPERSE GAS BUBBLES | APPLIED MATERIALS, INC. (US) | 2000-08-22 | — | — | US | claimed |
| EP-1018527-A2 | Nano-porous copolymer films having low dielectric constants | Applied Materials, Inc. (US) | 2000-07-12 | — | — | EP | claimed |
| WO-2000024050-A1 | CVD NANOPOROUS SILICA LOW DIELECTRIC CONSTANT FILMS | APPLIED MATERIALS, INC. (US) | 2000-04-27 | — | — | WO | claimed |
| WO-1999041423-A2 | PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | APPLIED MATERIALS, INC. (US) | 1999-08-19 | — | — | WO | claimed |
| US-4565714-A | ADHESIVES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-01-21 | — | — | US | claimed |
| US-4242479-A | CATALYST OF ALUMINUM TRIHALIDE, ORGANOSILOXANE COMPOUND OR ETHER, MAGNESIUM ALCOHOLATE, TITANIUM-HALOGEN AND ORGANOALUMINUM COMPOUNDS | SHOWA YUKA KABUSHIKI KAISHA (JP) | 1980-12-30 | — | — | US | claimed |